在扫描电子显微镜中确定静态电子辐照下绝缘体第二交叉能的新实验方法。

IF 2.1 3区工程技术 Q2 MICROSCOPY

Ultramicroscopy Pub Date : 2024-11-01 DOI:10.1016/j.ultramic.2024.114069

H. Hammami, S. Fakhfakh

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引用次数: 0

摘要

本文提出了一种新的实验方法，利用扫描电子显微镜（SEM）中的静电影响法（EIM）来估算不带电绝缘体的二次交叉能 EC2。这种实验方法基于对位移电流和泄漏电流的同步时间测量，接近于短脉冲辐照技术，但需要在静态电子辐照条件下进行，可以确定固有的二次电子发射率σ0（σ0 是辐照刚开始时在电荷大量积累或表面电势形成之前的总二次电子发射率值）。钠钙玻璃的 EC2 值通过另外两次基于二次电子成像的实验得到了证实。该值与之前其他基于表面电位测量或脉冲辐照技术的研究得出的值十分吻合。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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New experimental methodology for determining the second crossover energy in insulators under stationary e-irradiation in a SEM

A new experimental methodology is proposed which uses the electrostatic influence method (EIM) in scanning electron microscope (SEM) in order to estimate the second crossover energy E_C2 for uncharged insulators. This experimental methodology based on simultaneous time measurement of the displacement and leakage currents, is approached to the short pulse irradiation technique but under stationary e-irradiation and allows determining the intrinsic secondary electron emission yield, σ₀ (σ₀ is the value of the total secondary electron yield just at the beginning of the irradiation before significant charge accumulation or before the formation of a surface potential). The obtained value of E_C2 for soda-lime glass is confirmed by two additional experiments based on secondary electron imaging. This value is in good agreement with those previously obtained by other studies based on the surface potential measurement or the pulsed irradiation technique.

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来源期刊

Ultramicroscopy 工程技术-显微镜技术

CiteScore

4.60

自引率

13.60%

发文量

117

审稿时长

5.3 months

期刊介绍： Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.