通过双束过度曝光法制造亚衍射限制的莫特耶类基质结构,增强宽带红外抗反射应用(先进光学材料 29/2024)

IF 8 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Peng Ran, Qingsong Wang, Jiong Wang, Wenbo Chen, Zeyu Zhao, Xiaoliang Ma, Xiong Li, Mingbo Pu, Xiangang Luo
{"title":"通过双束过度曝光法制造亚衍射限制的莫特耶类基质结构,增强宽带红外抗反射应用(先进光学材料 29/2024)","authors":"Peng Ran,&nbsp;Qingsong Wang,&nbsp;Jiong Wang,&nbsp;Wenbo Chen,&nbsp;Zeyu Zhao,&nbsp;Xiaoliang Ma,&nbsp;Xiong Li,&nbsp;Mingbo Pu,&nbsp;Xiangang Luo","doi":"10.1002/adom.202470090","DOIUrl":null,"url":null,"abstract":"<p><b>Motheye-Like Metastructures with Broadband Infrared Antireflectivity</b></p><p>Materials possessing broadband antireflective properties benefit applications of military camouflage, photovoltaic devices, and highly transparent windows. In this work (see article number 2401341 by Zeyu Zhao, Xiangang Luo, and co-workers), large-area subdiffraction-limited motheye-like metastructures with broadband infrared antireflectivity are realized by dual-beam overexposure shrinking strategy and controllable anisotropic reactive ion etching process. A reflectivity across the overall spectrum of 3–12 µm lower than 2.0% is demonstrated.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":116,"journal":{"name":"Advanced Optical Materials","volume":"12 29","pages":""},"PeriodicalIF":8.0000,"publicationDate":"2024-10-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/adom.202470090","citationCount":"0","resultStr":"{\"title\":\"Subdiffraction-Limited Motheye-Like Metastructures Fabrication by Dual-Beam Overexposure Methodology Enhancing Broadband Infrared Antireflective Application (Advanced Optical Materials 29/2024)\",\"authors\":\"Peng Ran,&nbsp;Qingsong Wang,&nbsp;Jiong Wang,&nbsp;Wenbo Chen,&nbsp;Zeyu Zhao,&nbsp;Xiaoliang Ma,&nbsp;Xiong Li,&nbsp;Mingbo Pu,&nbsp;Xiangang Luo\",\"doi\":\"10.1002/adom.202470090\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><b>Motheye-Like Metastructures with Broadband Infrared Antireflectivity</b></p><p>Materials possessing broadband antireflective properties benefit applications of military camouflage, photovoltaic devices, and highly transparent windows. In this work (see article number 2401341 by Zeyu Zhao, Xiangang Luo, and co-workers), large-area subdiffraction-limited motheye-like metastructures with broadband infrared antireflectivity are realized by dual-beam overexposure shrinking strategy and controllable anisotropic reactive ion etching process. A reflectivity across the overall spectrum of 3–12 µm lower than 2.0% is demonstrated.\\n\\n <figure>\\n <div><picture>\\n <source></source></picture><p></p>\\n </div>\\n </figure></p>\",\"PeriodicalId\":116,\"journal\":{\"name\":\"Advanced Optical Materials\",\"volume\":\"12 29\",\"pages\":\"\"},\"PeriodicalIF\":8.0000,\"publicationDate\":\"2024-10-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://onlinelibrary.wiley.com/doi/epdf/10.1002/adom.202470090\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Optical Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/adom.202470090\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Optical Materials","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/adom.202470090","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

具有宽带红外抗反射性的类摩铁元结构具有宽带抗反射特性的材料有利于军事伪装、光伏设备和高透明窗户等应用。在这项研究中(见赵泽宇、罗贤刚及合作者的 2401341 号文章),通过双光束过曝收缩策略和可控各向异性反应离子刻蚀工艺,实现了具有宽带红外抗反射性的大面积亚衍射限制的类母细胞转移结构。结果表明,在 3-12 µm 的整个光谱范围内,反射率低于 2.0%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Subdiffraction-Limited Motheye-Like Metastructures Fabrication by Dual-Beam Overexposure Methodology Enhancing Broadband Infrared Antireflective Application (Advanced Optical Materials 29/2024)

Subdiffraction-Limited Motheye-Like Metastructures Fabrication by Dual-Beam Overexposure Methodology Enhancing Broadband Infrared Antireflective Application (Advanced Optical Materials 29/2024)

Motheye-Like Metastructures with Broadband Infrared Antireflectivity

Materials possessing broadband antireflective properties benefit applications of military camouflage, photovoltaic devices, and highly transparent windows. In this work (see article number 2401341 by Zeyu Zhao, Xiangang Luo, and co-workers), large-area subdiffraction-limited motheye-like metastructures with broadband infrared antireflectivity are realized by dual-beam overexposure shrinking strategy and controllable anisotropic reactive ion etching process. A reflectivity across the overall spectrum of 3–12 µm lower than 2.0% is demonstrated.

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来源期刊
Advanced Optical Materials
Advanced Optical Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-OPTICS
CiteScore
13.70
自引率
6.70%
发文量
883
审稿时长
1.5 months
期刊介绍: Advanced Optical Materials, part of the esteemed Advanced portfolio, is a unique materials science journal concentrating on all facets of light-matter interactions. For over a decade, it has been the preferred optical materials journal for significant discoveries in photonics, plasmonics, metamaterials, and more. The Advanced portfolio from Wiley is a collection of globally respected, high-impact journals that disseminate the best science from established and emerging researchers, aiding them in fulfilling their mission and amplifying the reach of their scientific discoveries.
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