磁控管法沉积硼涂层过程中等离子体参数的现场探针测量

IF 1.1 4区物理与天体物理 Q4 PHYSICS, APPLIED

Technical Physics Pub Date : 2024-09-27 DOI:10.1134/S1063784224070156

V. I. Gushenets, A. S. Bugaev, A. V. Vizir, E. M. Oks, A. G. Nikolaev, G. Yu. Yushkov

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引用次数: 0

摘要

本文介绍了探针技术的特点，并展示了测量平面磁控溅射系统在涂层沉积过程中使用纯硼靶材产生的等离子体参数的结果。探针测量的一个特点是对单个朗缪尔探针的收集表面进行加热。加热导致表面硼膜的电阻减小，从而可以在硼涂层的整个过程中对磁控放电等离子体参数进行现场探针测量。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

In Situ Probe Measurements of Plasma Parameters during the Deposition of Boron Coatings by the Magnetron Method

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In Situ Probe Measurements of Plasma Parameters during the Deposition of Boron Coatings by the Magnetron Method

The features of the probe technique are described and the results of measuring the parameters of plasma generated by a planar magnetron sputtering system with a pure boron target during coating deposition are presented. A feature of probe measurements was the use of heating the collecting surface of a single Langmuir probe. Heating led to a decrease in the electrical resistance of the boron film on the surface, which made it possible to carry out in situ probe measurements of the magnetron discharge plasma parameters during the entire process of boron coating.

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来源期刊

Technical Physics 物理-物理：应用

CiteScore

1.30

自引率

14.30%

发文量

139

审稿时长

3-6 weeks

期刊介绍： Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.