用于合成掩膜坯料的金属离子束溅射速度的角度依赖性研究

IF 1.1 4区物理与天体物理 Q4 PHYSICS, APPLIED

Technical Physics Pub Date : 2024-09-26 DOI:10.1134/S106378422406029X

M. S. Mikhailenko, A. E. Pestov, A. K. Chernyshev, N. I. Chkhalo

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引用次数: 0

摘要

在波长为 11.2 纳米附近的光刻掩模坯料中，提出了一种可作为吸收剂的替代材料--镍。在这项工作中已经确定，利用加速氩离子源高效溅射 Ru、Be 和 Ni 靶件，以制造 Ru/Be 多层结构和上层 Ni 的最佳角度为 60°。在此角度下，当氩离子能量为 800 eV、离子电流密度为 0.5 mA/cm2 时，三种材料的蚀刻速率均为 35 ± 5 nm/min。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Investigation of the Angular Dependences of the Velocities of Ion-Beam Sputtering of Metals for the Synthesis of Mask Blanks

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Investigation of the Angular Dependences of the Velocities of Ion-Beam Sputtering of Metals for the Synthesis of Mask Blanks

An alternative material has been proposed as an absorber for a mask blank for lithography in the vicinity of a wavelength of 11.2 nm – Ni. It has been established in this work that the optimal angle for efficient sputtering of Ru, Be, and Ni targets by accelerated argon ion sources for fabrication of a Ru/Be multilayer structure with an upper Ni layer is an angle of 60° degrees. At this angle, the etching rate for all three materials is 35 ± 5 nm/min at an argon ion energy of 800 eV and an ion current density of 0.5 mA/cm².

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来源期刊

Technical Physics 物理-物理：应用

CiteScore

1.30

自引率

14.30%

发文量

139

审稿时长

3-6 weeks

期刊介绍： Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.