{"title":"碳化硅表面与 H2O2 水溶液接触氧化的 Ab Initio 分子动力学方法","authors":"Tetsuya Morishita, Megumi Kayanuma, Tomohisa Kato","doi":"10.1021/acs.jpcc.4c03112","DOIUrl":null,"url":null,"abstract":"Controlling the oxidation of silicon carbide (SiC) is a key factor in fabricating SiC-based devices, such as power-integrated circuits and thermal protection systems. Oxidation is particularly utilized for machining SiC in conjunction with chemical–mechanical polishing. However, a thorough understanding of SiC oxidation at the microscopic level is lacking. Here, we performed <i>ab initio</i> molecular dynamics simulations to elucidate the microscopic mechanisms of the oxidation of OH- and H-terminated SiC surfaces in contact with an oxidizing solution─aqueous H<sub>2</sub>O<sub>2</sub> solution. We found that the OH-terminated (000<span>1</span>) C-face surface of SiC is more easily oxidized than the OH-terminated (0001) Si-face and H-terminated C- and Si-faces. The stability of the C–O and Si–O species on the surface plays a key role in the oxidation of the OH-terminated surfaces. The effect of H<sub>2</sub>O<sub>2</sub> concentration on the oxidation of the C-face was also examined. We found that the OH radicals generated from H<sub>2</sub>O<sub>2</sub> molecules undergo a facile conversion to H<sub>2</sub>O molecules in a pure H<sub>2</sub>O<sub>2</sub> solution. This phenomenon may explain the counterintuitive dependence of oxidation on the H<sub>2</sub>O<sub>2</sub> concentration observed in the experiments.","PeriodicalId":61,"journal":{"name":"The Journal of Physical Chemistry C","volume":null,"pages":null},"PeriodicalIF":3.3000,"publicationDate":"2024-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ab Initio Molecular Dynamics Approach for Oxidation of SiC Surface in Contact with Aqueous H2O2 Solutions\",\"authors\":\"Tetsuya Morishita, Megumi Kayanuma, Tomohisa Kato\",\"doi\":\"10.1021/acs.jpcc.4c03112\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Controlling the oxidation of silicon carbide (SiC) is a key factor in fabricating SiC-based devices, such as power-integrated circuits and thermal protection systems. Oxidation is particularly utilized for machining SiC in conjunction with chemical–mechanical polishing. However, a thorough understanding of SiC oxidation at the microscopic level is lacking. Here, we performed <i>ab initio</i> molecular dynamics simulations to elucidate the microscopic mechanisms of the oxidation of OH- and H-terminated SiC surfaces in contact with an oxidizing solution─aqueous H<sub>2</sub>O<sub>2</sub> solution. We found that the OH-terminated (000<span>1</span>) C-face surface of SiC is more easily oxidized than the OH-terminated (0001) Si-face and H-terminated C- and Si-faces. The stability of the C–O and Si–O species on the surface plays a key role in the oxidation of the OH-terminated surfaces. The effect of H<sub>2</sub>O<sub>2</sub> concentration on the oxidation of the C-face was also examined. We found that the OH radicals generated from H<sub>2</sub>O<sub>2</sub> molecules undergo a facile conversion to H<sub>2</sub>O molecules in a pure H<sub>2</sub>O<sub>2</sub> solution. This phenomenon may explain the counterintuitive dependence of oxidation on the H<sub>2</sub>O<sub>2</sub> concentration observed in the experiments.\",\"PeriodicalId\":61,\"journal\":{\"name\":\"The Journal of Physical Chemistry C\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":3.3000,\"publicationDate\":\"2024-09-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The Journal of Physical Chemistry C\",\"FirstCategoryId\":\"1\",\"ListUrlMain\":\"https://doi.org/10.1021/acs.jpcc.4c03112\",\"RegionNum\":3,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Journal of Physical Chemistry C","FirstCategoryId":"1","ListUrlMain":"https://doi.org/10.1021/acs.jpcc.4c03112","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
摘要
控制碳化硅(SiC)的氧化是制造基于碳化硅的设备(如功率集成电路和热保护系统)的关键因素。氧化尤其适用于结合化学机械抛光加工碳化硅。然而,目前还缺乏对碳化硅微观氧化的透彻了解。在此,我们进行了 ab initio 分子动力学模拟,以阐明与氧化溶液(H2O2 水溶液)接触的 OH 端和 H 端碳化硅表面氧化的微观机制。我们发现,SiC 的 OH 端接(0001)C 面比 OH 端接(0001)Si 面以及 H 端接 C 面和 Si 面更容易被氧化。表面上 C-O 和 Si-O 物种的稳定性在 OH 端接表面的氧化过程中起着关键作用。我们还研究了 H2O2 浓度对 C 面氧化的影响。我们发现,在纯 H2O2 溶液中,H2O2 分子产生的 OH 自由基很容易转化为 H2O 分子。这一现象可能解释了实验中观察到的氧化作用对 H2O2 浓度的反直觉依赖性。
Ab Initio Molecular Dynamics Approach for Oxidation of SiC Surface in Contact with Aqueous H2O2 Solutions
Controlling the oxidation of silicon carbide (SiC) is a key factor in fabricating SiC-based devices, such as power-integrated circuits and thermal protection systems. Oxidation is particularly utilized for machining SiC in conjunction with chemical–mechanical polishing. However, a thorough understanding of SiC oxidation at the microscopic level is lacking. Here, we performed ab initio molecular dynamics simulations to elucidate the microscopic mechanisms of the oxidation of OH- and H-terminated SiC surfaces in contact with an oxidizing solution─aqueous H2O2 solution. We found that the OH-terminated (0001) C-face surface of SiC is more easily oxidized than the OH-terminated (0001) Si-face and H-terminated C- and Si-faces. The stability of the C–O and Si–O species on the surface plays a key role in the oxidation of the OH-terminated surfaces. The effect of H2O2 concentration on the oxidation of the C-face was also examined. We found that the OH radicals generated from H2O2 molecules undergo a facile conversion to H2O molecules in a pure H2O2 solution. This phenomenon may explain the counterintuitive dependence of oxidation on the H2O2 concentration observed in the experiments.
期刊介绍:
The Journal of Physical Chemistry A/B/C is devoted to reporting new and original experimental and theoretical basic research of interest to physical chemists, biophysical chemists, and chemical physicists.