Jian Yuan, Xianbiao Shi, Hong Du, Wei Xia, Xia Wang, Jinguang Cheng, Baotian Wang, Ruidan Zhong, Shihao Zhang, Yanfeng Guo
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Magnetization dependent anisotropic topological properties in EuCuP
The correlation between magnetism and nontrivial topological band structure serves as a unique venue for discovering exotic topological properties. Combining magnetotransport measurements and first-principles calculations, we unveil herein that the hexagonal EuCuP holds a topologically trivial state in the paramagnetic structure, while strong magnetization dependent anisotropic topological states in the spin-polarization structures. Specifically, it hosts a trivial topological state in the in-plane spin-polarization structure, while a Weyl semimetal state in the out-of-plane spin-polarization structure. Our scaling analysis suggests that the intrinsic Berry curvature in the spin-polarization structures can account for the observed large anisotropic anomalous Hall effect. First-principles calculations show that the magnetization and the spin-orbit coupling simultaneously play essential roles for the appearance of the four pairs of Weyl points in the out-of-plane spin-polarization structure. Our work therefore establishes in EuCuP the intimate relation between magnetism and the nontrivial topological states, which would be instructive for future study on this key issue of topological physics.
期刊介绍:
Physical Review Materials is a new broad-scope international journal for the multidisciplinary community engaged in research on materials. It is intended to fill a gap in the family of existing Physical Review journals that publish materials research. This field has grown rapidly in recent years and is increasingly being carried out in a way that transcends conventional subject boundaries. The journal was created to provide a common publication and reference source to the expanding community of physicists, materials scientists, chemists, engineers, and researchers in related disciplines that carry out high-quality original research in materials. It will share the same commitment to the high quality expected of all APS publications.