通过超低能量电子辐照在二维半导体中产生具有超高空间分辨率的量子光

Ajit Kumar Dash, Sharad Kumar Yadav, Sebastien Roux, Manavendra Pratap Singh, Kenji Watanabe, Takashi Taniguchi, Akshay Naik, Cedric Robert, Xavier Marie, Akshay Singh
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引用次数: 0

摘要

二维材料的缺陷工程是制造单光子发射器(SPE)的理想材料,而空间确定性和质量保证的制造方法对于集成到量子器件和腔体中至关重要。现有方法采用应变和电子辐照或离子辐照相结合的方式,这使得制造过程变得复杂,并受到周围晶格损伤的限制。在这里,我们仅利用超低能量电子束辐照(5 keV)就能在封装了 hBN 的单层 MoS2 中产生微小的缺陷密度,并具有超高的空间分辨率(< 50 nm,可扩展至 10 nm)。低温光致发光光谱显示出尖锐的缺陷峰,单个缺陷的有限密度遵循幂律,而MoS2缺陷复合物则具有特征性的泽曼分裂。低动量电子辐照的使用、易处理性和高空间分辨率将破坏高质量 SPE 的确定性创建。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantum light generation with ultra-high spatial resolution in 2D semiconductors via ultra-low energy electron irradiation
Single photon emitters (SPEs) are building blocks of quantum technologies. Defect engineering of 2D materials is ideal to fabricate SPEs, wherein spatially deterministic and quality-preserving fabrication methods are critical for integration into quantum devices and cavities. Existing methods use combination of strain and electron irradiation, or ion irradiation, which make fabrication complex, and limited by surrounding lattice damage. Here, we utilise only ultra-low energy electron beam irradiation (5 keV) to create dilute defect density in hBN-encapsulated monolayer MoS2, with ultra-high spatial resolution (< 50 nm, extendable to 10 nm). Cryogenic photoluminescence spectra exhibit sharp defect peaks, following power-law for finite density of single defects, and characteristic Zeeman splitting for MoS2 defect complexes. The sharp peaks have low spectral jitter (< 200 {\mu}eV), and are tuneable with gate-voltage and electron beam energy. Use of low-momentum electron irradiation, ease of processing, and high spatial resolution, will disrupt deterministic creation of high-quality SPEs.
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