用于高压汞灯光刻技术的新型原氮磷酸盐-芳基硼酸盐光基发生器

IF 3 4区 化学 Q3 CHEMISTRY, PHYSICAL
Yuji Shibasaki, Junichi Sato
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引用次数: 0

摘要

在此,我们开发了新型硼酸酯类光碱发生器(PBGs),可生成一种被称为 Verkade 碱(2,8,9-三异丁基-2,5,8,9-四氮杂-1-磷杂双环[3.3.3]十一烷 (TTP))的原氮磷烷,并使用高压汞灯进行光分光。合成了八种 PBG,每种都具有不同的硼酸酯取代基:苯基、对氟苯基、对甲苯基、对甲氧基苯基、间氟对甲基苯基、4-联苯基、2-萘基和 6-甲氧基-2-萘基。通过紫外-可见光谱和随时间变化的密度泛函理论计算,分析了这些取代基与其光吸收特性之间的关系。带有 6-甲氧基-2-萘基硼酸酯基团的 PBG(TTP-四[2-(6-甲氧基萘基)]硼酸酯(TTP-TMNB))在 365 纳米(高压汞灯的 i 线)附近表现出很强的光吸收能力,在氚代四氢呋喃(THF)中暴露于 650 mJ/cm2 时,产生约 60% 的相应 TTP,1H 核磁共振光谱证实了这一点。为了评估其光刻潜力,将 TTP-TMNB 与环氧树脂(jER1001)和聚(甲基丙烯酸)-共聚(甲基丙烯酸甲酯)共聚物(PMA1.6-co-PMMA100)在 THF 中混合。将得到的混合物旋涂在硅晶片上,然后用 i 线通过光罩照射,形成负色调图像。据测量,这种光聚合物系统的灵敏度和对比度分别为 45 mJ/cm2 和 1.0;此外,还实现了清晰的 10 微米负色调分辨率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Novel Photobase Generators Derived from Proazaphosphatrane–Aryl Borate for High-Pressure Mercury Lamp Lithography

Novel Photobase Generators Derived from Proazaphosphatrane–Aryl Borate for High-Pressure Mercury Lamp Lithography

Herein, novel borate-type photobase generators (PBGs) that generate a proazaphosphatrane known as Verkade's base (2,8,9-triisobuthyl-2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane (TTP)) were developed for photopatterning using a high-pressure mercury lamp. Eight PBGs were synthesized, each featuring distinct borate substituents: phenyl, p-fluorophenyl, p-tolyl, p-methoxyphenyl, m-fluoro-p-methylphenyl, 4-biphenyl, 2-naphthyl, and 6-methoxy-2-naphthyl. The relation between these substituents and their light absorption characteristics was analyzed via ultraviolet–visible spectroscopy and time-dependent density functional theory calculations. The PBG with the 6-methoxy-2-naphthylborate group (TTP–tetrakis[2-(6-methoxynaphthyl)]borate (TTP–TMNB)) demonstrated substantial light absorption near 365 nm (the i-line of the high-pressure mercury lamp), generating approximately 60 % of the corresponding TTP in deuterated tetrahydrofuran (THF) upon exposure to 650 mJ/cm2, as confirmed via 1H nuclear magnetic resonance spectroscopy. To evaluate its photolithographic potential, TTP–TMNB was mixed with epoxy resin (jER1001) and a poly(methacrylic acid)-co-poly(methyl methacrylate) copolymer (PMA1.6-co-PMMA100) in THF. The resulting mixture was spin-coated onto a silicon wafer and irradiated with the i-line through a photomask to create a negative-tone image. The sensitivity and contrast of this photopolymer system were measured to be 45 mJ/cm2 and 1.0, respectively; moreover, a clear 10-μm negative-tone resolution was achieved.

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来源期刊
ChemPhotoChem
ChemPhotoChem Chemistry-Physical and Theoretical Chemistry
CiteScore
5.80
自引率
5.40%
发文量
165
期刊介绍: Light plays a crucial role in natural processes and leads to exciting phenomena in molecules and materials. ChemPhotoChem welcomes exceptional international research in the entire scope of pure and applied photochemistry, photobiology, and photophysics. Our thorough editorial practices aid us in publishing authoritative research fast. We support the photochemistry community to be a leading light in science. We understand the huge pressures the scientific community is facing every day and we want to support you. Chemistry Europe is an association of 16 chemical societies from 15 European countries. Run by chemists, for chemists—we evaluate, publish, disseminate, and amplify the scientific excellence of chemistry researchers from around the globe.
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