A. A. Samokhvalov, K. A. Sergushichev, S. I. Eliseev, T. P. Bronzov, E. P. Bolshakov, D. V. Getman, A. A. Smirnov
{"title":"波长范围为 2-5 纳米的紧凑型软 X 射线源的参数优化","authors":"A. A. Samokhvalov, K. A. Sergushichev, S. I. Eliseev, T. P. Bronzov, E. P. Bolshakov, D. V. Getman, A. A. Smirnov","doi":"10.1134/s106378422401033x","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>This paper presents a compact source of soft X-ray radiation for operation in the wavelength range of 2–5 nm with a pulse repetition frequency of more than 500 Hz. The source parameters were optimized to reduce the intensity of ablation of the discharge volume wall and obtain the maximum intensity of the spectral lines of multicharged ions CV—4 nm and Ar IX—4.87 nm. The obtained results can be used in the development of a microscope for the tasks of cell transmission microscopy with nanometer resolution.</p>","PeriodicalId":783,"journal":{"name":"Technical Physics","volume":null,"pages":null},"PeriodicalIF":1.1000,"publicationDate":"2024-09-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimization of Parameters of a Compact Soft X-Ray Source for Operation in the Wavelength Range 2–5 nm\",\"authors\":\"A. A. Samokhvalov, K. A. Sergushichev, S. I. Eliseev, T. P. Bronzov, E. P. Bolshakov, D. V. Getman, A. A. Smirnov\",\"doi\":\"10.1134/s106378422401033x\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<h3 data-test=\\\"abstract-sub-heading\\\">Abstract</h3><p>This paper presents a compact source of soft X-ray radiation for operation in the wavelength range of 2–5 nm with a pulse repetition frequency of more than 500 Hz. The source parameters were optimized to reduce the intensity of ablation of the discharge volume wall and obtain the maximum intensity of the spectral lines of multicharged ions CV—4 nm and Ar IX—4.87 nm. The obtained results can be used in the development of a microscope for the tasks of cell transmission microscopy with nanometer resolution.</p>\",\"PeriodicalId\":783,\"journal\":{\"name\":\"Technical Physics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.1000,\"publicationDate\":\"2024-09-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Technical Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1134/s106378422401033x\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1134/s106378422401033x","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
摘要
摘要 本文介绍了一种紧凑型软 X 射线辐射源,其工作波长范围为 2-5 nm,脉冲重复频率超过 500 Hz。对放射源参数进行了优化,以降低放电体积壁的烧蚀强度,并获得多充离子 CV-4 nm 和 Ar IX-4.87 nm 光谱线的最大强度。所获得的结果可用于开发具有纳米分辨率的细胞透射显微镜。
Optimization of Parameters of a Compact Soft X-Ray Source for Operation in the Wavelength Range 2–5 nm
Abstract
This paper presents a compact source of soft X-ray radiation for operation in the wavelength range of 2–5 nm with a pulse repetition frequency of more than 500 Hz. The source parameters were optimized to reduce the intensity of ablation of the discharge volume wall and obtain the maximum intensity of the spectral lines of multicharged ions CV—4 nm and Ar IX—4.87 nm. The obtained results can be used in the development of a microscope for the tasks of cell transmission microscopy with nanometer resolution.
期刊介绍:
Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.