使用四重 emICCD 摄影系统对同轴电极配置中的纳秒脉冲放电进行连续诊断

Zhengyan Liu, Yoichi Hirakawa, Kazuto Yamamoto, Terumasa Ryu, Jie Li, Nan Jiang, Takao Namihira, Douyan Wang
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引用次数: 0

摘要

了解初级流的快速动态对于理解纳秒脉冲放电过程至关重要。为了揭示快速原生流过程,本研究引入了一种新开发的四倍 emICCD 照相系统,该系统能够在单脉冲中捕捉四幅放电图像序列,并配有用于数据分析的自定制软件。我们在同轴反应器中使用了全时域为 10.5 毫微秒的纳秒脉冲功率,重点研究了主流线的动态。我们的研究阐明了原生流特性的时空变化,并考察了它们与内电极直径(i.d. 0.2-2.0 mm)的关系。结果表明,在脉冲供电的同轴电极中,原生流线过程分为三个阶段,而内径是影响流线形成和传播的重要因素。有趣的是,我们发现在流线通道到达外电极之前,单个流线的流头速度、流线宽度和流线面积保持不变。此外,我们还观察到,随着 i.d 值的增加,流线头速度和流线宽度都会先增加后减小。这项研究揭示了纳秒脉冲放电过程中主流的基本特性,为未来的等离子体应用提供了宝贵的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Consecutive diagnosis of nanosecond pulsed discharge in a coaxial electrode configuration using a quadruple emICCD camera system
Understanding the rapid dynamics of the primary streamer is crucial for comprehending the nanosecond pulsed discharge process. To reveal the fast primary streamer process, this study introduces a newly developed quadruple emICCD camera system capable of capturing a sequence of four discharge images in single pulse, coupled with self-customized software for data analysis. A nanosecond pulse power with its FWHM of 10.5 ns was applied to a coaxial reactor, focusing on the dynamics of the primary streamer. Our research clarifies the spatiotemporal variations of the primary streamer’s properties and examines their relation with inner electrode diameter (i.d. 0.2–2.0 mm). Results showed that in a pulse-powered coaxial electrode, there are three stages in the primary streamer process and that i.d. serves as an important factor influencing the formation and propagation of streamers. Interestingly, we found that streamer head velocity, streamer width, and streamer area for individual streamers remain constant prior to streamer channels reaching the outer electrode. Furthermore, we also observed an initial increase followed by a decrease in both streamer head velocity and streamer width with increasing i.d values. This study sheds light on the fundamental properties of the primary streamer during nanosecond pulsed discharge, contributing valuable insights for future plasma applications.
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