催化裂化金属在 (100)、(110) 和 (211) NaCl 表面的外延生长

Praveen Kumar Rai, Nilabh Dish
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引用次数: 0

摘要

有关在氯化钠(NaCl)的裂隙面上低温外延生长蒸镀面心立方(fcc)金属薄膜的研究表明,在有关去离子水对专门制备的氯化钠(110)和(211)晶面的影响的综合研究方面存在明显的差距。本研究强调了活性污染物在使用闪蒸技术在(110)和(211)抛光面上定向生长连续金属薄膜(特别是银(Ag)、金(Au)和铜(Cu))过程中的关键作用。闪蒸对凝聚过程中取向变化的影响得到了强调,从而影响了金属膜的外延取向。此外,该研究还介绍了乙醇处理和炉退火氯化钠表面外延的显著增强,而无需对湿法剥离的独立薄膜进行沉积后退火。通过电子衍射确定了基底和沉积物之间的外延关系,同时利用透射电子显微镜检查了湿法剥离薄膜中存在的晶体缺陷。这项研究为了解在经过特殊处理的氯化钠晶面上生长金属薄膜的复杂性提供了宝贵的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Epitaxial Growth of FCC Metals on the (100), (110), and (211) NaCl Surfaces

Epitaxial Growth of FCC Metals on the (100), (110), and (211) NaCl Surfaces

The research conducted on the low-temperature epitaxial growth of vapor-deposited thin face-centered cubic (fcc) metal films on the cleavage face of sodium chloride (NaCl) reveals a notable gap in comprehensive studies concerning the influence of deionized water on specially prepared (110) and (211) crystal faces of NaCl. This study emphasizes the crucial role of active contaminants in the oriented growth of thin continuous metal films, specifically silver (Ag), gold (Au), and copper (Cu), on the (110) and (211) polished faces using the flash-evaporation technique. The impact of flash evaporation on orientation changes during coalescence is highlighted, influencing the epitaxial orientation of metal films. Moreover, the research introduces a significant enhancement of epitaxy on ethanol-treated and furnace-annealed NaCl faces without the need for post-deposition annealing of wet-stripped free-standing films. The epitaxial relationships between substrates and deposits were determined through electron diffraction, while transmission electron microscopy was employed to examine crystalline defects present in wet-stripped films. This work contributes valuable insights into the intricacies of thin metal film growth on specifically treated NaCl crystal faces.

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