用于场效应晶体管量子输运预测的物理集成神经网络

Xiuying Zhang, Linqiang Xu, Jing Lu, Zhaofu Zhang, Lei Shen
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引用次数: 0

摘要

基于量子力学的输运模拟对于超短沟道场效应晶体管(FET)的设计非常重要,它能够理解物理机制,但同时也面临着计算强度高的主要挑战。传统的机器学习有望加速场效应晶体管的优化设计,但由于缺乏高保真数据集和物理知识的整合,机器学习在这一领域的应用受到了限制。在这里,我们引入了一个物理集成神经网络框架,利用内部开发的高保真数据库预测 5 纳米以下全栅极 (GAA) FET 的传输曲线。数据库中的传输曲线收集自文献和我们的第一原理计算。除了硅之外,我们还将不同结构相的砷化铟、磷化铟和硒纳米线作为场效应晶体管的沟道材料。然后,我们建立了一个物理知识集成超矢量神经网络(PHVNN),在预测传输特性的输入中加入了五个新的物理特征,取得了 0.39 的足够低的平均绝对误差。特别是,目前约 98% 的预测残差都在一个数量级之内。利用 PHVNN,我们有效地筛选出了对称 p 型 GAA 场效应晶体管,这些晶体管具有与当时型晶体管相同的性能指标,这对于制造同质 CMOS 电路至关重要。最后,我们的自动微分分析为 PHVNN 提供了可解释的见解,突出了新输入参数的重要贡献,提高了 PHVNN 的可靠性。我们的方法为快速筛选合适的 GAA FET 提供了一种有效的方法,有望加快下一代电子器件的设计进程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Physics-integrated Neural Network for Quantum Transport Prediction of Field-effect Transistor
Quantum-mechanics-based transport simulation is of importance for the design of ultra-short channel field-effect transistors (FETs) with its capability of understanding the physical mechanism, while facing the primary challenge of the high computational intensity. Traditional machine learning is expected to accelerate the optimization of FET design, yet its application in this field is limited by the lack of both high-fidelity datasets and the integration of physical knowledge. Here, we introduced a physics-integrated neural network framework to predict the transport curves of sub-5-nm gate-all-around (GAA) FETs using an in-house developed high-fidelity database. The transport curves in the database are collected from literature and our first-principles calculations. Beyond silicon, we included indium arsenide, indium phosphide, and selenium nanowires with different structural phases as the FET channel materials. Then, we built a physical-knowledge-integrated hyper vector neural network (PHVNN), in which five new physical features were added into the inputs for prediction transport characteristics, achieving a sufficiently low mean absolute error of 0.39. In particular, ~98% of the current prediction residuals are within one order of magnitude. Using PHVNN, we efficiently screened out the symmetric p-type GAA FETs that possess the same figures of merit with the n-type ones, which are crucial for the fabrication of homogeneous CMOS circuits. Finally, our automatic differentiation analysis provides interpretable insights into the PHVNN, which highlights the important contributions of our new input parameters and improves the reliability of PHVNN. Our approach provides an effective method for rapidly screening appropriate GAA FETs with the prospect of accelerating the design process of next-generation electronic devices.
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