用于生物电子学的超薄氧化铟锡蓄积模式电解质门控晶体管

Ludovico Migliaccio, Mehmet Girayhan Say, Gaurav Pathak, Imrich Gablech, Jan Brodský, Mary Jocelyn Donahue, Eric Daniel Głowacki
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摘要

电解质门控场效应晶体管和电化学晶体管已成为生物电子传感器和生物电位记录装置的强大元件。在开发放大微弱电生理信号的设备时,必须考虑一系列参数。这些参数包括最大跨导值、截止频率和较大的导通/截止电流比。基于有机聚合物的器件最近在该领域占据了主导地位,尤其是在考虑灵活性这一关键因素时。氧化物半导体也可以提供这些特性,以及更高的迁移率等优势。本文报告了柔性超薄铟锡氧化物(ITO)电解质门控晶体管。这些积聚模式器件结合了 n 型操作(µe = 9.5 cm2 Vs-1)、高跨导(gm = 44 mS)、导通/截止比(105)以及光学透明布局。氧化物通常被认为是脆性物质,而机械柔性 ITO 层则是通过在对二甲苯 C 上室温沉积非晶层而获得的。然而,ITO 会在循环过程中发生电化学降解。为克服这一问题,可在表面钝化高介电常数的 Ta2O5 或 Ta2O5/AlN 惰性封盖层。这大大提高了稳定性,同时保持了较低的栅极电压。基于其整体性能,基于 ITO 的 EGFET 在生物电子学领域大有可为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Ultrathin Indium Tin Oxide Accumulation Mode Electrolyte‐Gated Transistors for Bioelectronics

Ultrathin Indium Tin Oxide Accumulation Mode Electrolyte‐Gated Transistors for Bioelectronics
Electrolyte‐gated field effect transistors and electrochemical transistors have emerged as powerful components for bioelectronic sensors and biopotential recording devices. A set of parameters must be considered when developing devices to amplify weak electrophysiological signals. These include maximum transconductance values, cut‐off frequencies, and large on/off current ratios. Organic polymer‐based devices have recently dominated the field, especially when considering flexibility as a key factor. Oxide semiconductors may also offer these features, as well as advantages like higher mobility. Herein, flexible, ultrathin, indium tin oxide (ITO) electrolyte‐gated transistors are reported. These accumulation‐mode devices combine n‐type operation with µe = 9.5 cm2 Vs−1, high transconductance (gm = 44 mS), and on/off ratios (105) as well as optically transparent layouts. While oxides are normally considered brittle, mechanically flexible ITO layers are obtained by room temperature deposition of amorphous layers onto parylene C. This process results in low strain, producing devices that survive bending. ITO electrochemically degrades, however, with cycling. To overcome this, the surface is passivated with high dielectric constant inert capping layers of Ta2O5 or Ta2O5/AlN. This greatly improves stability while preserving low gate voltages. Based on their overall performance, ITO‐based EGFETs are promising for bioelectronics.
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