662 keV Cs1+ 离子辐射对 PVDF/Ba0.5Sr0.5TiO3 厚膜介电行为的影响

IF 1.9 4区工程技术 Q3 ENGINEERING, CHEMICAL

Chemical Engineering Communications Pub Date : 2024-08-12 DOI:10.1080/00986445.2024.2386308

Shobhneek Kaur, Sachin Jaidka, Aayush Gupta, Blaz Likozar, Arvind D. Sabharwal

引用次数: 0

摘要

采用溶液浇铸法合成了 PVDF/BST 厚膜。在 PVDF 基体中引入 BST 增加了厚膜的介电常数（ε′）。随后，...

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Effect of 662 keV Cs1+ ion radiation on the dielectric behavior of the PVDF/Ba0.5Sr0.5TiO3 thick films

The PVDF/BST thick films were synthesized using a solution casting method. The introduction of BST into the PVDF matrix increased the dielectric constant (ε′) of the thick films. Subsequently, the ...

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来源期刊

Chemical Engineering Communications 工程技术-工程：化工

CiteScore

5.50

自引率

4.00%

发文量

审稿时长

6 months

期刊介绍： Chemical Engineering Communications provides a forum for the publication of manuscripts reporting on results of both basic and applied research in all areas of chemical engineering. The journal''s audience includes researchers and practitioners in academia, industry, and government. Chemical Engineering Communications publishes full-length research articles dealing with completed research projects on subjects such as experimentation (both techniques and data) and new theoretical models. Critical review papers reporting on the current state of the art in topical areas of chemical engineering are also welcome; submission of these is strongly encouraged.