用强光脉冲改变植入硅表面

IF 0.48 Q4 Physics and Astronomy

Bulletin of the Russian Academy of Sciences: Physics Pub Date : 2024-08-19 DOI:10.1134/S1062873824707189

B. F. Farrakhov, Ya. V. Fattakhov, A. L. Stepanov

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引用次数: 0

摘要

摘要研究了在离子注入前后对近表面硅层进行改性的可能性，然后进行脉冲光退火，以对衬底表面进行结构化处理，从而提高其在太阳能领域的使用效率。研究结果与在单晶硅和植入锗上获得的数据进行了比较。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Modification of the Implanted Silicon Surface by a Powerful Light Pulse

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Modification of the Implanted Silicon Surface by a Powerful Light Pulse

A study was made of the possibility of modifying the near-surface silicon layer before and after ion implantation, followed by pulsed light annealing, to structure the surface of the substrates to increase the efficiency of their use in solar energy. The results were compared with the data obtained on monocrystalline and implanted germanium.

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来源期刊

Bulletin of the Russian Academy of Sciences: Physics Physics and Astronomy-Physics and Astronomy (all)

CiteScore

0.90

自引率

0.00%

发文量

251

期刊介绍： Bulletin of the Russian Academy of Sciences: Physics is an international peer reviewed journal published with the participation of the Russian Academy of Sciences. It presents full-text articles (regular, letters to the editor, reviews) with the most recent results in miscellaneous fields of physics and astronomy: nuclear physics, cosmic rays, condensed matter physics, plasma physics, optics and photonics, nanotechnologies, solar and astrophysics, physical applications in material sciences, life sciences, etc. Bulletin of the Russian Academy of Sciences: Physics focuses on the most relevant multidisciplinary topics in natural sciences, both fundamental and applied. Manuscripts can be submitted in Russian and English languages and are subject to peer review. Accepted articles are usually combined in thematic issues on certain topics according to the journal editorial policy. Authors featured in the journal represent renowned scientific laboratories and institutes from different countries, including large international collaborations. There are globally recognized researchers among the authors: Nobel laureates and recipients of other awards, and members of national academies of sciences and international scientific societies.