Minhyun Cho, Biswajit Datta, Kwanghee Han, Saroj B. Chand, Pratap Chandra Adak, Sichao Yu, Fengping Li, Kenji Watanabe, Takashi Taniguchi, James Hone, Jeil Jung, Gabriele Grosso, Young Duck Kim, Vinod M. Menon
{"title":"通过扭曲氢化硼实现莫伊里激子极子工程","authors":"Minhyun Cho, Biswajit Datta, Kwanghee Han, Saroj B. Chand, Pratap Chandra Adak, Sichao Yu, Fengping Li, Kenji Watanabe, Takashi Taniguchi, James Hone, Jeil Jung, Gabriele Grosso, Young Duck Kim, Vinod M. Menon","doi":"arxiv-2409.06999","DOIUrl":null,"url":null,"abstract":"Twisted hexagonal boron nitride (thBN) exhibits emergent ferroelectricity due\nto the formation of moir\\'e superlattices with alternating AB and BA domains.\nThese domains possess electric dipoles, leading to a periodic electrostatic\npotential that can be imprinted onto other 2D materials placed in its\nproximity. Here we demonstrate the remote imprinting of moir\\'e patterns from\ntwisted hexagonal boron nitride (thBN) onto monolayer MoSe2 and investigate the\nresulting changes in the exciton properties. We confirm the imprinting of\nmoir\\'e patterns on monolayer MoSe2 via proximity using Kelvin probe force\nmicroscopy (KPFM) and hyperspectral photoluminescence (PL) mapping. By\ndeveloping a technique to create large ferroelectric domain sizes ranging from\n1 {\\mu}m to 8.7 {\\mu}m, we achieve unprecedented potential modulation of 387 +-\n52 meV. We observe the formation of exciton polarons due to charge\nredistribution caused by the antiferroelectric moir\\'e domains and investigate\nthe optical property changes induced by the moir\\'e pattern in monolayer MoSe2\nby varying the moir\\'e pattern size down to 110 nm. Our findings highlight the\npotential of twisted hBN as a platform for controlling the optical and\nelectronic properties of 2D materials for optoelectronic and valleytronic\napplications.","PeriodicalId":501214,"journal":{"name":"arXiv - PHYS - Optics","volume":"41 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Moiré exciton polaron engineering via twisted hBN\",\"authors\":\"Minhyun Cho, Biswajit Datta, Kwanghee Han, Saroj B. Chand, Pratap Chandra Adak, Sichao Yu, Fengping Li, Kenji Watanabe, Takashi Taniguchi, James Hone, Jeil Jung, Gabriele Grosso, Young Duck Kim, Vinod M. Menon\",\"doi\":\"arxiv-2409.06999\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Twisted hexagonal boron nitride (thBN) exhibits emergent ferroelectricity due\\nto the formation of moir\\\\'e superlattices with alternating AB and BA domains.\\nThese domains possess electric dipoles, leading to a periodic electrostatic\\npotential that can be imprinted onto other 2D materials placed in its\\nproximity. Here we demonstrate the remote imprinting of moir\\\\'e patterns from\\ntwisted hexagonal boron nitride (thBN) onto monolayer MoSe2 and investigate the\\nresulting changes in the exciton properties. We confirm the imprinting of\\nmoir\\\\'e patterns on monolayer MoSe2 via proximity using Kelvin probe force\\nmicroscopy (KPFM) and hyperspectral photoluminescence (PL) mapping. By\\ndeveloping a technique to create large ferroelectric domain sizes ranging from\\n1 {\\\\mu}m to 8.7 {\\\\mu}m, we achieve unprecedented potential modulation of 387 +-\\n52 meV. We observe the formation of exciton polarons due to charge\\nredistribution caused by the antiferroelectric moir\\\\'e domains and investigate\\nthe optical property changes induced by the moir\\\\'e pattern in monolayer MoSe2\\nby varying the moir\\\\'e pattern size down to 110 nm. Our findings highlight the\\npotential of twisted hBN as a platform for controlling the optical and\\nelectronic properties of 2D materials for optoelectronic and valleytronic\\napplications.\",\"PeriodicalId\":501214,\"journal\":{\"name\":\"arXiv - PHYS - Optics\",\"volume\":\"41 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-09-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"arXiv - PHYS - Optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/arxiv-2409.06999\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"arXiv - PHYS - Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/arxiv-2409.06999","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Twisted hexagonal boron nitride (thBN) exhibits emergent ferroelectricity due
to the formation of moir\'e superlattices with alternating AB and BA domains.
These domains possess electric dipoles, leading to a periodic electrostatic
potential that can be imprinted onto other 2D materials placed in its
proximity. Here we demonstrate the remote imprinting of moir\'e patterns from
twisted hexagonal boron nitride (thBN) onto monolayer MoSe2 and investigate the
resulting changes in the exciton properties. We confirm the imprinting of
moir\'e patterns on monolayer MoSe2 via proximity using Kelvin probe force
microscopy (KPFM) and hyperspectral photoluminescence (PL) mapping. By
developing a technique to create large ferroelectric domain sizes ranging from
1 {\mu}m to 8.7 {\mu}m, we achieve unprecedented potential modulation of 387 +-
52 meV. We observe the formation of exciton polarons due to charge
redistribution caused by the antiferroelectric moir\'e domains and investigate
the optical property changes induced by the moir\'e pattern in monolayer MoSe2
by varying the moir\'e pattern size down to 110 nm. Our findings highlight the
potential of twisted hBN as a platform for controlling the optical and
electronic properties of 2D materials for optoelectronic and valleytronic
applications.