二吡咯烷烯镓(I)络合物反应的选择性控制

IF 2.1 3区 化学 Q3 CHEMISTRY, INORGANIC & NUCLEAR
Tim Richter, Stefan Thum, Oliver P.E. Townrow, Jens Langer, Michael Wiesinger, Sjoerd Harder
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引用次数: 0

摘要

继最近分离出首个带有单阴离子二吡咯并噻吩配体(DPM)的低价 GaI 复合物并对其进行结构表征之后,本研究又描述了在 1 位和 9 位带有笨重芳基取代基的 (DPM)GaI 复合物。本研究的重点是具有甲苯甲基取代基(MesDPM)、2,6-二异丙基苯基取代基(DIPPDPM)或 10-异丙基-9-蒽基取代基(iPr-AnthDPM)的三种 DPM 配体;并介绍了后一种未知配体的合成方法。前体 (RDPM)GaI2 是通过相应的碱金属配合物 (RDPM)M (M = Na 或 K)与 GaI3 反应得到的,并通过 X 射线衍射进行了表征。晶体结构显示,两个侧翼芳基有效地屏蔽了 GaI2 单元。在随后的还原步骤中,分离出了 (DIPPDPM)GaI 和 (iPr-AnthDPM)GaI。将(DIPPDPM)GaI 的晶体结构与类似的 β-二亚基 GaI 复合物的晶体结构进行比较后发现,DPM 复合物中的镓中心被侧翼的 DIPP 取代基很好地屏蔽了。尽管这种配体几何形状有利,但由于进一步与第二个等量的 Me3SiN3 反应,相应 (DPM)Ga=N(SiMe3) 复合物的分离失败了。这导致了四氮唑复合物 (tBuDPM)Ga[N4(SiMe3)2] 和酰胺/叠氮化物组合 (iPr-AnthDPM)Ga(N3)N(SiMe3)2 的纯净形成,两者都通过 X 射线衍射进行了结构表征。这两种复合物的选择性形成表明,DPM 配体中的取代基有效地控制了反应的进程。DFT 计算表明,与取代基(tBu、DIPP 或 iPr-Anth)无关,酰胺/叠氮化物组合总是比四氮唑产物稳定约 20 kcal/mol。因此,后者必须通过动力学控制才能形成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Selectivity control in the reactivity of dipyrromethene gallium(I) complexes

Selectivity control in the reactivity of dipyrromethene gallium(I) complexes

Following the recent isolation and structural characterization of the first low-valent GaI complex with a monoanionic dipyrromethenide ligand (DPM), herein (DPM)GaI complexes with bulky aryl-substituents in the 1- and 9-positions are described. This study focusses on three DPM ligands with mesityl substituents (MesDPM), 2,6-diisopropylphenyl substituents (DIPPDPM), or 10-isopropyl-9-anthracenyl substituents (iPr-AnthDPM); the synthesis to the latter unknown ligand is described. The precursors (RDPM)GaI2 were obtained by reaction of the corresponding alkali metal complexes (RDPM)M (M = Na or K) with GaI3 and characterized by X-ray diffraction. Crystal structures show the efficient shielding of the GaI2 unit by two flanking aryl groups. In a subsequent reduction step, (DIPPDPM)GaI and (iPr-AnthDPM)GaI have been isolated. Comparison of the crystal structure of (DIPPDPM)GaI with that of a similar β-diketiminate GaI complex shows that the Ga center in the DPM complex is well shielded by flanking DIPP substituents. Despite this favorable ligand geometry, isolation of the corresponding (DPM)Ga=N(SiMe3) complexes failed due to further reaction with a second equivalent of Me3SiN3. This resulted in clean formation of the tetrazagallole complex (tBuDPM)Ga[N4(SiMe3)2] and the amide/azide combination (iPr-AnthDPM)Ga(N3)N(SiMe3)2, both structurally characterized by X-ray diffraction. Selective formation of both complexes shows that the substituents in the DPM ligand effectively control the course of the reaction. DFT calculations show that independent of the substituent (tBu, DIPP, or iPr-Anth) the amide/azide combination is always circa 20 kcal/mol more stable than the tetrazagallole product. The latter must therefore be formed by kinetic control.

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来源期刊
Journal of Organometallic Chemistry
Journal of Organometallic Chemistry 化学-无机化学与核化学
CiteScore
4.40
自引率
8.70%
发文量
221
审稿时长
36 days
期刊介绍: The Journal of Organometallic Chemistry targets original papers dealing with theoretical aspects, structural chemistry, synthesis, physical and chemical properties (including reaction mechanisms), and practical applications of organometallic compounds. Organometallic compounds are defined as compounds that contain metal - carbon bonds. The term metal includes all alkali and alkaline earth metals, all transition metals and the lanthanides and actinides in the Periodic Table. Metalloids including the elements in Group 13 and the heavier members of the Groups 14 - 16 are also included. The term chemistry includes syntheses, characterizations and reaction chemistry of all such compounds. Research reports based on use of organometallic complexes in bioorganometallic chemistry, medicine, material sciences, homogeneous catalysis and energy conversion are also welcome. The scope of the journal has been enlarged to encompass important research on organometallic complexes in bioorganometallic chemistry and material sciences, and of heavier main group elements in organometallic chemistry. The journal also publishes review articles, short communications and notes.
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