纳米结构 MnMoO4 作为整体水分离和二氧化碳还原的三功能电催化剂

IF 4.3 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
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引用次数: 0

摘要

电化学水分离和二氧化碳还原是生产氢气和低碳燃料等可再生能源的重要过程。在此,研究人员采用回流沉淀法制备了纳米结构的 MnMoO4,并将其作为整体水分离和二氧化碳还原反应的三功能电催化剂进行了研究。结合漫反射光谱和电化学阻抗谱结果,实验得出所制备的 MnMoO4 的直接带隙为 3.05 eV。在 5 mA cm-2 的电流密度下,氧进化反应的过电位为 0.36 V,塔菲尔斜率为 58 mV dec-1。当电流密度为 3 mA cm-2 时,在 0.1 M KOH 溶液中不存在和存在二氧化碳的情况下,过电位分别为 0.39 V 和 0.58 V,强调了二氧化碳还原中间产物对氢进化反应的毒害作用。根据所获得的结果,MnMoO4 可能是一种很有前途的用于水分离和二氧化碳还原反应的电催化剂。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Nanostructured MnMoO4 as a trifunctional electrocatalyst for overall water splitting and CO2 reduction

Nanostructured MnMoO4 as a trifunctional electrocatalyst for overall water splitting and CO2 reduction

Electrochemical water splitting and CO2 reduction are important processes to produce hydrogen and low–carbon fuels as renewable energy sources. Here, nanostructured MnMoO4, prepared by the reflux precipitation method, was investigated as a trifunctional electrocatalyst for overall water splitting and CO2 reduction reactions. Using a combination of diffuse reflectance spectroscopy and electrochemical impedance spectroscopy results, a direct band gap of 3.05 eV was obtained experimentally for the prepared MnMoO4. An overpotential of 0.36 V at a current density of 5 mA cm−2 and a Tafel slope of 58 mV dec−1 were obtained for the oxygen evolution reaction. At a current density of 3 mA cm−2, overpotentials of 0.39 V and 0.58 V were achieved in the absence and presence of CO2 bubbling into a 0.1 M KOH solution, respectively, emphasizing the poisoning effect of CO2 reduction intermediates for the hydrogen evolution reaction. Based on the obtained results, MnMoO4 could be a promising electrocatalyst for water splitting and CO2 reduction reactions.

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来源期刊
Materials Chemistry and Physics
Materials Chemistry and Physics 工程技术-材料科学:综合
CiteScore
8.70
自引率
4.30%
发文量
1515
审稿时长
69 days
期刊介绍: Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.
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