{"title":"蓝宝石超精密磨削中的表面下损伤","authors":"","doi":"10.1016/j.jmapro.2024.08.056","DOIUrl":null,"url":null,"abstract":"<div><p>This work is to investigate the subsurface damage distribution law and suppression methods in sapphire ultra-precision grinding. The grinding strategies of rough grinding, semi-finish grinding and ultra-precision grinding are used to suppress the subsurface damage, the effects of grinding wheel grit size and number of grinding passes on the subsurface damage are investigated. First, cross-section polishing, FIB, and ion beam polishing were employed to reveal the scale and distribution of subsurface damage. Second, chemical etching was performed on the subsurface, the subsurface cracks with different grinding strategies were exposed, and the crack distribution density was obtained by image processing. Then, the subsurface deformation behavior and microcrack formation mechanism were investigated by TEM. The damage scales of different grinding strategies were evaluated using photothermal absorption. Ultimate, ultra-precision grinding can control the subsurface damage scale to 3.9 μm, the mechanisms of subsurface damage generation and removal were revealed. Meanwhile, a subsurface damage model more suitable for the combined grinding strategy was proposed.</p></div>","PeriodicalId":16148,"journal":{"name":"Journal of Manufacturing Processes","volume":null,"pages":null},"PeriodicalIF":6.1000,"publicationDate":"2024-09-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Subsurface damage in sapphire ultra-precision grinding\",\"authors\":\"\",\"doi\":\"10.1016/j.jmapro.2024.08.056\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>This work is to investigate the subsurface damage distribution law and suppression methods in sapphire ultra-precision grinding. The grinding strategies of rough grinding, semi-finish grinding and ultra-precision grinding are used to suppress the subsurface damage, the effects of grinding wheel grit size and number of grinding passes on the subsurface damage are investigated. First, cross-section polishing, FIB, and ion beam polishing were employed to reveal the scale and distribution of subsurface damage. Second, chemical etching was performed on the subsurface, the subsurface cracks with different grinding strategies were exposed, and the crack distribution density was obtained by image processing. Then, the subsurface deformation behavior and microcrack formation mechanism were investigated by TEM. The damage scales of different grinding strategies were evaluated using photothermal absorption. Ultimate, ultra-precision grinding can control the subsurface damage scale to 3.9 μm, the mechanisms of subsurface damage generation and removal were revealed. Meanwhile, a subsurface damage model more suitable for the combined grinding strategy was proposed.</p></div>\",\"PeriodicalId\":16148,\"journal\":{\"name\":\"Journal of Manufacturing Processes\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":6.1000,\"publicationDate\":\"2024-09-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Manufacturing Processes\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1526612524008879\",\"RegionNum\":1,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"ENGINEERING, MANUFACTURING\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Manufacturing Processes","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1526612524008879","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0
摘要
本研究旨在探讨蓝宝石超精密磨削中的次表面损伤分布规律及抑制方法。采用粗磨、半精磨和超精磨的磨削策略抑制次表面损伤,研究了砂轮粒度和磨削遍数对次表面损伤的影响。首先,采用截面抛光、FIB 和离子束抛光来揭示次表面损伤的规模和分布。其次,对次表面进行化学蚀刻,暴露出不同磨削策略下的次表面裂纹,并通过图像处理获得裂纹分布密度。然后,用 TEM 研究了次表层的变形行为和微裂纹的形成机理。采用光热吸收法评估了不同磨削策略的损伤尺度。最终,超精密磨削可将表层下损伤尺度控制在 3.9 μm,并揭示了表层下损伤的产生和消除机制。同时,提出了更适合联合磨削策略的表层下损伤模型。
Subsurface damage in sapphire ultra-precision grinding
This work is to investigate the subsurface damage distribution law and suppression methods in sapphire ultra-precision grinding. The grinding strategies of rough grinding, semi-finish grinding and ultra-precision grinding are used to suppress the subsurface damage, the effects of grinding wheel grit size and number of grinding passes on the subsurface damage are investigated. First, cross-section polishing, FIB, and ion beam polishing were employed to reveal the scale and distribution of subsurface damage. Second, chemical etching was performed on the subsurface, the subsurface cracks with different grinding strategies were exposed, and the crack distribution density was obtained by image processing. Then, the subsurface deformation behavior and microcrack formation mechanism were investigated by TEM. The damage scales of different grinding strategies were evaluated using photothermal absorption. Ultimate, ultra-precision grinding can control the subsurface damage scale to 3.9 μm, the mechanisms of subsurface damage generation and removal were revealed. Meanwhile, a subsurface damage model more suitable for the combined grinding strategy was proposed.
期刊介绍:
The aim of the Journal of Manufacturing Processes (JMP) is to exchange current and future directions of manufacturing processes research, development and implementation, and to publish archival scholarly literature with a view to advancing state-of-the-art manufacturing processes and encouraging innovation for developing new and efficient processes. The journal will also publish from other research communities for rapid communication of innovative new concepts. Special-topic issues on emerging technologies and invited papers will also be published.