用于电子应用的聚合物/空气等离子体处理氧化石墨烯纳米复合材料的介电性能研究

IF 2.6 3区物理与天体物理 Q2 PHYSICS, MULTIDISCIPLINARY

Physica Scripta Pub Date : 2024-08-07 DOI:10.1088/1402-4896/ad6945

Shankar S Humbe, Pratibha S Jadhav, Girish M Joshi and R R Deshmukh

{"title":"用于电子应用的聚合物/空气等离子体处理氧化石墨烯纳米复合材料的介电性能研究","authors":"Shankar S Humbe, Pratibha S Jadhav, Girish M Joshi and R R Deshmukh","doi":"10.1088/1402-4896/ad6945","DOIUrl":null,"url":null,"abstract":"In the present study we emphasized on the dielectric properties of Ethylene Vinyl Acetate (EVA) filled with untreated and plasma-treated graphene oxide (GO). The chemical fingerprints of EVA/GO were analysed using FTIR. Decreased ID/IG ratio from 2.99 to 2.75 and 1.60 to 1.16 due to exposed plasma was confirmed by Raman spectroscopy. X-ray diffraction (XRD) disclosed the decreased degree of crystallinity. Electric properties were measured by impedance analyser, dielectric constant was increased upto 11% for untreated GO dispersion and 47% for Air treated Plasma GO dispersed EVA composites. Plasma treatment further improved the exfoliated sites of GO and induced the defects, leading to optimized dielectric properties. Improved dielectric properties of EVA/GO can provide valuable insights into the potential applications in the field of electrical connectors, film capacitors, and pseudo capacitors.","PeriodicalId":20067,"journal":{"name":"Physica Scripta","volume":null,"pages":null},"PeriodicalIF":2.6000,"publicationDate":"2024-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Study of dielectric properties of polymer/air plasma treated graphene oxide nanocomposites for electronic applications\",\"authors\":\"Shankar S Humbe, Pratibha S Jadhav, Girish M Joshi and R R Deshmukh\",\"doi\":\"10.1088/1402-4896/ad6945\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In the present study we emphasized on the dielectric properties of Ethylene Vinyl Acetate (EVA) filled with untreated and plasma-treated graphene oxide (GO). The chemical fingerprints of EVA/GO were analysed using FTIR. Decreased ID/IG ratio from 2.99 to 2.75 and 1.60 to 1.16 due to exposed plasma was confirmed by Raman spectroscopy. X-ray diffraction (XRD) disclosed the decreased degree of crystallinity. Electric properties were measured by impedance analyser, dielectric constant was increased upto 11% for untreated GO dispersion and 47% for Air treated Plasma GO dispersed EVA composites. Plasma treatment further improved the exfoliated sites of GO and induced the defects, leading to optimized dielectric properties. Improved dielectric properties of EVA/GO can provide valuable insights into the potential applications in the field of electrical connectors, film capacitors, and pseudo capacitors.\",\"PeriodicalId\":20067,\"journal\":{\"name\":\"Physica Scripta\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.6000,\"publicationDate\":\"2024-08-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physica Scripta\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1088/1402-4896/ad6945\",\"RegionNum\":3,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physica Scripta","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1088/1402-4896/ad6945","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 0

摘要

在本研究中，我们重点研究了填充了未经处理和等离子处理的氧化石墨烯（GO）的乙烯-醋酸乙烯酯（EVA）的介电性能。我们使用傅立叶变换红外光谱分析了 EVA/GO 的化学指纹。拉曼光谱证实，由于暴露在等离子体中，ID/IG 比率从 2.99 降至 2.75，从 1.60 降至 1.16。X 射线衍射 (XRD) 揭示了结晶度的降低。通过阻抗分析仪测量了电性能，未经处理的 GO 分散体的介电常数增加了 11%，而经过空气处理的等离子体 GO 分散 EVA 复合材料的介电常数增加了 47%。等离子处理进一步改善了 GO 的剥离点，并诱发了缺陷，从而优化了介电性能。EVA/GO 介电性能的改善可为电连接器、薄膜电容器和伪电容器领域的潜在应用提供有价值的见解。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Study of dielectric properties of polymer/air plasma treated graphene oxide nanocomposites for electronic applications

In the present study we emphasized on the dielectric properties of Ethylene Vinyl Acetate (EVA) filled with untreated and plasma-treated graphene oxide (GO). The chemical fingerprints of EVA/GO were analysed using FTIR. Decreased ID/IG ratio from 2.99 to 2.75 and 1.60 to 1.16 due to exposed plasma was confirmed by Raman spectroscopy. X-ray diffraction (XRD) disclosed the decreased degree of crystallinity. Electric properties were measured by impedance analyser, dielectric constant was increased upto 11% for untreated GO dispersion and 47% for Air treated Plasma GO dispersed EVA composites. Plasma treatment further improved the exfoliated sites of GO and induced the defects, leading to optimized dielectric properties. Improved dielectric properties of EVA/GO can provide valuable insights into the potential applications in the field of electrical connectors, film capacitors, and pseudo capacitors.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Physica Scripta 物理-物理：综合

CiteScore

3.70

自引率

3.40%

发文量

782

审稿时长

4.5 months

期刊介绍： Physica Scripta is an international journal for original research in any branch of experimental and theoretical physics. Articles will be considered in any of the following topics, and interdisciplinary topics involving physics are also welcomed: -Atomic, molecular and optical physics- Plasma physics- Condensed matter physics- Mathematical physics- Astrophysics- High energy physics- Nuclear physics- Nonlinear physics. The journal aims to increase the visibility and accessibility of research to the wider physical sciences community. Articles on topics of broad interest are encouraged and submissions in more specialist fields should endeavour to include reference to the wider context of their research in the introduction.