实现自旋元斯托克斯天空离子

IF 2 4区 物理与天体物理 Q3 OPTICS
Tianyue Li, Mengjiao Liu, Chen Chen, Xingyi Li, Jiahao Hou, Xing Yang, Shuming Wang and Shining Zhu
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引用次数: 0

摘要

拓扑保护的光天线纹理因其在下一代高密度数据存储和逻辑器件中的潜在应用而备受关注。然而,要在芯片上实现紧凑、可调的天空离子模式仍然是一项艰巨的挑战。在这项工作中,我们提出了一种利用双折射元表面生成和操纵自旋多路光子天离子纹理的新方法。通过将独立的相位剖面编码到正交自旋态上,我们通过斯托克斯参数测量观察到了反天空离子和天空离子的出现,阐明了它们独特的拓扑特性。这种自旋多路复用元表面平台不仅有助于实现高维多路复用,还能实现拓扑准粒子的微型化,为光存储、信息处理和通信领域的应用提供了广阔前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Realization of spinful metaphotonic stokes skyrmions
Topologically protected skyrmion textures of light have garnered significant attention due to their potential applications in next-generation high-density data storage and logic devices. However, achieving compact and tunable on-chip skyrmion modes remains a formidable challenge. In this work, we present a novel approach empowered by birefringent metasurfaces to generate and manipulate spin-multiplexed photonic skyrmion textures. By encoding independent phase profiles onto orthogonal spin states, we observe the emergence of anti-skyrmions and skyrmioniums via Stokes parameter measurements, elucidating their distinct topological characteristics. This spin-multiplexed metasurface platform not only facilitates high-dimensional multiplexing but also enables the miniaturization of topological quasi-particles, offering promising prospects for applications in optical memory, information processing, and communications.
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来源期刊
CiteScore
4.50
自引率
4.80%
发文量
237
审稿时长
1.9 months
期刊介绍: Journal of Optics publishes new experimental and theoretical research across all areas of pure and applied optics, both modern and classical. Research areas are categorised as: Nanophotonics and plasmonics Metamaterials and structured photonic materials Quantum photonics Biophotonics Light-matter interactions Nonlinear and ultrafast optics Propagation, diffraction and scattering Optical communication Integrated optics Photovoltaics and energy harvesting We discourage incremental advances, purely numerical simulations without any validation, or research without a strong optics advance, e.g. computer algorithms applied to optical and imaging processes, equipment designs or material fabrication.
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