基于可光刻图案化 SU-8/石墨烯纳米复合材料的应变传感器，用于软-MEMS 应用

IF 2.4 4区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Journal of Micromechanics and Microengineering Pub Date : 2024-08-07 DOI:10.1088/1361-6439/ad690e

Faizan Tariq Beigh, Nadeem Tariq Beigh and Dhiman Mallick

{"title":"基于可光刻图案化 SU-8/石墨烯纳米复合材料的应变传感器，用于软-MEMS 应用","authors":"Faizan Tariq Beigh, Nadeem Tariq Beigh and Dhiman Mallick","doi":"10.1088/1361-6439/ad690e","DOIUrl":null,"url":null,"abstract":"This paper presents an optimized, lithographically patternable SU-8/Graphene nanocomposite based piezoresistive strain sensor for localized, high-precision assessment, which marks a significant advancement in the field of soft-MEMS based technologies. The fabrication process involves the photolithography of a SU-8/Graphene nanocomposite with a minimum resolution of 50 μm, resulting in a material with excellent electrical conductivity and mechanical properties. Specifically, a 3% SU-8/Graphene composition was chosen to exceed the percolation threshold, enabling substantial changes in the resistance and facilitating photopatternability. The sensor exhibited exceptional performance characteristics, including a rapid response time of 0.1 s and a wide bending range from 0° to 60°. Notably, it demonstrated a remarkable %ΔR/R of 19.21, indicating its superior sensing capability. Such high sensitivity is crucial for applications that require precise, localized measurements, such as biomedical engineering, sports science, and smart healthcare.","PeriodicalId":16346,"journal":{"name":"Journal of Micromechanics and Microengineering","volume":"12 1","pages":""},"PeriodicalIF":2.4000,"publicationDate":"2024-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Lithographically patternable SU-8/Graphene nanocomposite based strain sensors for soft-MEMS applications\",\"authors\":\"Faizan Tariq Beigh, Nadeem Tariq Beigh and Dhiman Mallick\",\"doi\":\"10.1088/1361-6439/ad690e\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents an optimized, lithographically patternable SU-8/Graphene nanocomposite based piezoresistive strain sensor for localized, high-precision assessment, which marks a significant advancement in the field of soft-MEMS based technologies. The fabrication process involves the photolithography of a SU-8/Graphene nanocomposite with a minimum resolution of 50 μm, resulting in a material with excellent electrical conductivity and mechanical properties. Specifically, a 3% SU-8/Graphene composition was chosen to exceed the percolation threshold, enabling substantial changes in the resistance and facilitating photopatternability. The sensor exhibited exceptional performance characteristics, including a rapid response time of 0.1 s and a wide bending range from 0° to 60°. Notably, it demonstrated a remarkable %ΔR/R of 19.21, indicating its superior sensing capability. Such high sensitivity is crucial for applications that require precise, localized measurements, such as biomedical engineering, sports science, and smart healthcare.\",\"PeriodicalId\":16346,\"journal\":{\"name\":\"Journal of Micromechanics and Microengineering\",\"volume\":\"12 1\",\"pages\":\"\"},\"PeriodicalIF\":2.4000,\"publicationDate\":\"2024-08-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Micromechanics and Microengineering\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6439/ad690e\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micromechanics and Microengineering","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/1361-6439/ad690e","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

引用次数: 0

摘要

本文介绍了一种优化的、可光刻图案化的 SU-8/Graphene 纳米复合材料压阻应变传感器，用于局部高精度评估，标志着基于软-MEMS 技术领域的重大进展。制造工艺包括对 SU-8/Graphene 纳米复合材料进行光刻，最小分辨率为 50 μm，从而获得了一种具有优异导电性和机械性能的材料。具体来说，选择了 3% 的 SU-8/Graphene 成分，使其超过了渗滤阈值，从而使电阻发生了重大变化，并提高了光可塑性。该传感器表现出卓越的性能特点，包括 0.1 秒的快速响应时间和 0° 至 60° 的宽弯曲范围。值得一提的是，它的 %ΔR/R 值高达 19.21，显示了其卓越的传感能力。如此高的灵敏度对于生物医学工程、体育科学和智能医疗保健等需要精确、局部测量的应用至关重要。

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Lithographically patternable SU-8/Graphene nanocomposite based strain sensors for soft-MEMS applications

This paper presents an optimized, lithographically patternable SU-8/Graphene nanocomposite based piezoresistive strain sensor for localized, high-precision assessment, which marks a significant advancement in the field of soft-MEMS based technologies. The fabrication process involves the photolithography of a SU-8/Graphene nanocomposite with a minimum resolution of 50 μm, resulting in a material with excellent electrical conductivity and mechanical properties. Specifically, a 3% SU-8/Graphene composition was chosen to exceed the percolation threshold, enabling substantial changes in the resistance and facilitating photopatternability. The sensor exhibited exceptional performance characteristics, including a rapid response time of 0.1 s and a wide bending range from 0° to 60°. Notably, it demonstrated a remarkable %ΔR/R of 19.21, indicating its superior sensing capability. Such high sensitivity is crucial for applications that require precise, localized measurements, such as biomedical engineering, sports science, and smart healthcare.

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来源期刊

Journal of Micromechanics and Microengineering 工程技术-材料科学：综合

CiteScore

4.50

自引率

4.30%

发文量

136

审稿时长

2.8 months

期刊介绍： Journal of Micromechanics and Microengineering (JMM) primarily covers experimental work, however relevant modelling papers are considered where supported by experimental data. The journal is focussed on all aspects of: -nano- and micro- mechanical systems -nano- and micro- electomechanical systems -nano- and micro- electrical and mechatronic systems -nano- and micro- engineering -nano- and micro- scale science Please note that we do not publish materials papers with no obvious application or link to nano- or micro-engineering. Below are some examples of the topics that are included within the scope of the journal: -MEMS and NEMS: Including sensors, optical MEMS/NEMS, RF MEMS/NEMS, etc. -Fabrication techniques and manufacturing: Including micromachining, etching, lithography, deposition, patterning, self-assembly, 3d printing, inkjet printing. -Packaging and Integration technologies. -Materials, testing, and reliability. -Micro- and nano-fluidics: Including optofluidics, acoustofluidics, droplets, microreactors, organ-on-a-chip. -Lab-on-a-chip and micro- and nano-total analysis systems. -Biomedical systems and devices: Including bio MEMS, biosensors, assays, organ-on-a-chip, drug delivery, cells, biointerfaces. -Energy and power: Including power MEMS/NEMS, energy harvesters, actuators, microbatteries. -Electronics: Including flexible electronics, wearable electronics, interface electronics. -Optical systems. -Robotics.