不同基底温度下溅射沉积 Ni3Al 薄膜的微观结构和机械性能研究

IF 1.1 4区物理与天体物理 Q3 NUCLEAR SCIENCE & TECHNOLOGY

Radiation Effects and Defects in Solids Pub Date : 2024-08-09 DOI:10.1080/10420150.2024.2378409

Sunil Kumar Tiwari, Akula Umamaheswara Rao, Piyush Chandra Verma, Gaurav Pant, Devesh Kumar Avasthi, Sudip Sen, Amit Kumar Chawla

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引用次数: 0

摘要

通过直流磁控溅射法在不同基底温度下将 Ni3Al 薄膜沉积在硅 (100) 基底上。这些薄膜的相变、微观结构、表面形貌和机械性能均发生了变化。

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Investigation of microstructural and mechanical properties of sputter-deposited Ni3Al films at different substrate temperatures

Ni3Al films were deposited on silicon (100) substrate at different substrate temperatures by DC magnetron sputtering. The evolution of phase, microstructure, surface topography and mechanical prope...

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来源期刊

Radiation Effects and Defects in Solids 物理-核科学技术

CiteScore

1.60

自引率

20.00%

发文量

107

审稿时长

4 months

期刊介绍： The Journal covers a wide range of topics under radiation and plasma sciences. The range of contributions encompasses: radiation physics; radiochemistry, radiobiology and physical effects of medical irradiation, including research on radiative cell degeneration; optical, electrical and mechanical effects of radiation, and their secondary effects such as diffusion and particle emission from surfaces; plasma techniques and plasma phenomena. On plasma science the Journal covers all areas of fusion, space and low temperature plasmas.