坚硬和光学透明纳米复合 Al-Si-N 薄膜的疏水性和高温机械性能

IF 2.7 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Soni, S. K. Sharma, S. K. Mishra
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引用次数: 0

摘要

通过磁控溅射法在 SS 304、硅和石英基底上沉积了铝-硅-氮纳米复合薄膜。在 AlN 中添加硅使涂层结构从单相涂层转变为纳米复合结构薄膜。它影响了 Al-Si-N 薄膜中的相形成和带间电子转变。XPS 研究表明,在 Al-Si-N 薄膜中形成了 Al-N、Si-N 和复合 Al-Si-N 相。在纳米复合 Al-Si-N 薄膜中,随着硅的加入,Urbach 能量从 535 meV 增加到 763 meV。在 400 °C 以下,硬度和微观结构没有发生明显变化。Al-Si-N 薄膜在 SS 304 和石英基底上都表现出良好的疏水性和高硬度。低润湿性和高强度使它们成为光学保护涂层的潜在候选材料,因为它们也是光学透明的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Hydrophobicity and high-temperature mechanical behaviour of hard and optically transparent nanocomposite Al–Si–N thin films

Hydrophobicity and high-temperature mechanical behaviour of hard and optically transparent nanocomposite Al–Si–N thin films

Nanocomposite Al–Si–N thin films were deposited on SS 304, silicon and quartz substrates through magnetron sputtering. Silicon addition in AlN has transformed the coating structure from a single-phase coating into a nanocomposite structured film. It affected the phase formation and interband electronic transition in the Al–Si–N thin film. XPS study suggests the formation of Al–N, Si–N and composite Al–Si–N phases in the Al–Si–N film. The Urbach energy increases from 535 to 763 meV with addition of Si, for nanocomposite Al–Si–N film. No significant change in hardness and microstructure were observed up to 400 °C. The Al–Si–N film showed good hydrophobicity on both SS 304 and quartz substrates along with high hardness values. Low wettability and high strength make them a potential candidate for protective optical coatings as they are optically transparent too.

Graphical abstract

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来源期刊
Journal of Materials Research
Journal of Materials Research 工程技术-材料科学:综合
CiteScore
4.50
自引率
3.70%
发文量
362
审稿时长
2.8 months
期刊介绍: Journal of Materials Research (JMR) publishes the latest advances about the creation of new materials and materials with novel functionalities, fundamental understanding of processes that control the response of materials, and development of materials with significant performance improvements relative to state of the art materials. JMR welcomes papers that highlight novel processing techniques, the application and development of new analytical tools, and interpretation of fundamental materials science to achieve enhanced materials properties and uses. Materials research papers in the following topical areas are welcome. • Novel materials discovery • Electronic, photonic and magnetic materials • Energy Conversion and storage materials • New thermal and structural materials • Soft materials • Biomaterials and related topics • Nanoscale science and technology • Advances in materials characterization methods and techniques • Computational materials science, modeling and theory
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