{"title":"在石墨烯/超导体双层中观测到第二个狄拉克点","authors":"Gopi Nath Daptary, Eyal Walach, Udit Khanna, Efrat Shimshoni, Aviad Frydman","doi":"10.1103/physrevmaterials.8.084802","DOIUrl":null,"url":null,"abstract":"Two-dimensional (2D) materials have attracted vast research interest since the breakthrough discovery of graphene. One major benefit of such systems is the ability to tune the Fermi level through the charge neutrality point between electron and hole doping. Here we show that single layer graphene coupled to the low-density superconductor indium oxide (InO) exhibits two charge neutrality points, each of them representing electronic regions in which the carrier density can be tuned from hole to electron dominated. This is not seen in clean graphene or in a bilayer where the carrier density is extremely low. We suggest that the second charge neutrality point results from regions in the graphene layer just below superconducting islands in InO, where pairing is induced via the proximity effect; gating of this hybrid system therefore allows the tuning from hole to electron superconductivity through an ultralow carrier density regime. We propose this as a “superconducting Dirac point (SDP)” where intravalley scattering is greatly enhanced. Our results suggest that the electronic states around SDP behave like those in a strongly coupled superconductor.","PeriodicalId":20545,"journal":{"name":"Physical Review Materials","volume":"51 1","pages":""},"PeriodicalIF":3.1000,"publicationDate":"2024-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Observation of a second Dirac point in a graphene/superconductor bilayer\",\"authors\":\"Gopi Nath Daptary, Eyal Walach, Udit Khanna, Efrat Shimshoni, Aviad Frydman\",\"doi\":\"10.1103/physrevmaterials.8.084802\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Two-dimensional (2D) materials have attracted vast research interest since the breakthrough discovery of graphene. One major benefit of such systems is the ability to tune the Fermi level through the charge neutrality point between electron and hole doping. Here we show that single layer graphene coupled to the low-density superconductor indium oxide (InO) exhibits two charge neutrality points, each of them representing electronic regions in which the carrier density can be tuned from hole to electron dominated. This is not seen in clean graphene or in a bilayer where the carrier density is extremely low. We suggest that the second charge neutrality point results from regions in the graphene layer just below superconducting islands in InO, where pairing is induced via the proximity effect; gating of this hybrid system therefore allows the tuning from hole to electron superconductivity through an ultralow carrier density regime. We propose this as a “superconducting Dirac point (SDP)” where intravalley scattering is greatly enhanced. Our results suggest that the electronic states around SDP behave like those in a strongly coupled superconductor.\",\"PeriodicalId\":20545,\"journal\":{\"name\":\"Physical Review Materials\",\"volume\":\"51 1\",\"pages\":\"\"},\"PeriodicalIF\":3.1000,\"publicationDate\":\"2024-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physical Review Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1103/physrevmaterials.8.084802\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physical Review Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1103/physrevmaterials.8.084802","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Observation of a second Dirac point in a graphene/superconductor bilayer
Two-dimensional (2D) materials have attracted vast research interest since the breakthrough discovery of graphene. One major benefit of such systems is the ability to tune the Fermi level through the charge neutrality point between electron and hole doping. Here we show that single layer graphene coupled to the low-density superconductor indium oxide (InO) exhibits two charge neutrality points, each of them representing electronic regions in which the carrier density can be tuned from hole to electron dominated. This is not seen in clean graphene or in a bilayer where the carrier density is extremely low. We suggest that the second charge neutrality point results from regions in the graphene layer just below superconducting islands in InO, where pairing is induced via the proximity effect; gating of this hybrid system therefore allows the tuning from hole to electron superconductivity through an ultralow carrier density regime. We propose this as a “superconducting Dirac point (SDP)” where intravalley scattering is greatly enhanced. Our results suggest that the electronic states around SDP behave like those in a strongly coupled superconductor.
期刊介绍:
Physical Review Materials is a new broad-scope international journal for the multidisciplinary community engaged in research on materials. It is intended to fill a gap in the family of existing Physical Review journals that publish materials research. This field has grown rapidly in recent years and is increasingly being carried out in a way that transcends conventional subject boundaries. The journal was created to provide a common publication and reference source to the expanding community of physicists, materials scientists, chemists, engineers, and researchers in related disciplines that carry out high-quality original research in materials. It will share the same commitment to the high quality expected of all APS publications.