Kangning Du, Zhen Wang, Lin Cao, Yanan Guo, Shu Tian, Fan Zhang
{"title":"HCGAN:用于无配对素描人脸合成的分层对比生成对抗网络","authors":"Kangning Du, Zhen Wang, Lin Cao, Yanan Guo, Shu Tian, Fan Zhang","doi":"10.7717/peerj-cs.2184","DOIUrl":null,"url":null,"abstract":"Transforming optical facial images into sketches while preserving realism and facial features poses a significant challenge. The current methods that rely on paired training data are costly and resource-intensive. Furthermore, they often fail to capture the intricate features of faces, resulting in substandard sketch generation. To address these challenges, we propose the novel hierarchical contrast generative adversarial network (HCGAN). Firstly, HCGAN consists of a global sketch synthesis module that generates sketches with well-defined global features and a local sketch refinement module that enhances the ability to extract features in critical areas. Secondly, we introduce local refinement loss based on the local sketch refinement module, refining sketches at a granular level. Finally, we propose an association strategy called “warmup-epoch” and local consistency loss between the two modules to ensure HCGAN is effectively optimized. Evaluations of the CUFS and SKSF-A datasets demonstrate that our method produces high-quality sketches and outperforms existing state-of-the-art methods in terms of fidelity and realism. Compared to the current state-of-the-art methods, HCGAN reduces FID by 12.6941, 4.9124, and 9.0316 on three datasets of CUFS, respectively, and by 7.4679 on the SKSF-A dataset. Additionally, it obtained optimal scores for content fidelity (CF), global effects (GE), and local patterns (LP). The proposed HCGAN model provides a promising solution for realistic sketch synthesis under unpaired data training.","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":null,"pages":null},"PeriodicalIF":4.3000,"publicationDate":"2024-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"HCGAN: hierarchical contrast generative adversarial network for unpaired sketch face synthesis\",\"authors\":\"Kangning Du, Zhen Wang, Lin Cao, Yanan Guo, Shu Tian, Fan Zhang\",\"doi\":\"10.7717/peerj-cs.2184\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Transforming optical facial images into sketches while preserving realism and facial features poses a significant challenge. The current methods that rely on paired training data are costly and resource-intensive. Furthermore, they often fail to capture the intricate features of faces, resulting in substandard sketch generation. To address these challenges, we propose the novel hierarchical contrast generative adversarial network (HCGAN). Firstly, HCGAN consists of a global sketch synthesis module that generates sketches with well-defined global features and a local sketch refinement module that enhances the ability to extract features in critical areas. Secondly, we introduce local refinement loss based on the local sketch refinement module, refining sketches at a granular level. Finally, we propose an association strategy called “warmup-epoch” and local consistency loss between the two modules to ensure HCGAN is effectively optimized. Evaluations of the CUFS and SKSF-A datasets demonstrate that our method produces high-quality sketches and outperforms existing state-of-the-art methods in terms of fidelity and realism. Compared to the current state-of-the-art methods, HCGAN reduces FID by 12.6941, 4.9124, and 9.0316 on three datasets of CUFS, respectively, and by 7.4679 on the SKSF-A dataset. Additionally, it obtained optimal scores for content fidelity (CF), global effects (GE), and local patterns (LP). The proposed HCGAN model provides a promising solution for realistic sketch synthesis under unpaired data training.\",\"PeriodicalId\":3,\"journal\":{\"name\":\"ACS Applied Electronic Materials\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":4.3000,\"publicationDate\":\"2024-07-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Electronic Materials\",\"FirstCategoryId\":\"94\",\"ListUrlMain\":\"https://doi.org/10.7717/peerj-cs.2184\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"94","ListUrlMain":"https://doi.org/10.7717/peerj-cs.2184","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
HCGAN: hierarchical contrast generative adversarial network for unpaired sketch face synthesis
Transforming optical facial images into sketches while preserving realism and facial features poses a significant challenge. The current methods that rely on paired training data are costly and resource-intensive. Furthermore, they often fail to capture the intricate features of faces, resulting in substandard sketch generation. To address these challenges, we propose the novel hierarchical contrast generative adversarial network (HCGAN). Firstly, HCGAN consists of a global sketch synthesis module that generates sketches with well-defined global features and a local sketch refinement module that enhances the ability to extract features in critical areas. Secondly, we introduce local refinement loss based on the local sketch refinement module, refining sketches at a granular level. Finally, we propose an association strategy called “warmup-epoch” and local consistency loss between the two modules to ensure HCGAN is effectively optimized. Evaluations of the CUFS and SKSF-A datasets demonstrate that our method produces high-quality sketches and outperforms existing state-of-the-art methods in terms of fidelity and realism. Compared to the current state-of-the-art methods, HCGAN reduces FID by 12.6941, 4.9124, and 9.0316 on three datasets of CUFS, respectively, and by 7.4679 on the SKSF-A dataset. Additionally, it obtained optimal scores for content fidelity (CF), global effects (GE), and local patterns (LP). The proposed HCGAN model provides a promising solution for realistic sketch synthesis under unpaired data training.