氢传感应用中的氧化锌镁薄膜研究

Materials Pub Date : 2024-07-25 DOI:10.3390/ma17153677
Tien-Chai Lin, Jyun-Yan Wu, Andres Joseph John Mendez, Nadir Salazar, Hao-Lin Hsu, Wen-Chang Huang
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引用次数: 0

摘要

本研究介绍了一种利用射频共溅射(RF co-sputtering)技术沉积的氧化镁锌(MgZnO)薄膜制成的氢传感器。在沉积氧化镁(MgO)和氧化锌(ZnO)薄膜时,分别使用了不同的氧化镁(MgO)和氧化锌(ZnO)靶材,并试验了不同的沉积时间和功率水平。当暴露在浓度为 1000ppm 的氢气中时,传感器的性能最佳(传感响应为 2.46)。当氧化镁薄膜厚度为 432 纳米(nm)、温度为 300 ℃ 时,传感器的性能达到峰值。最初,传感器的响应速度随着薄膜厚度的增加而提高。这是因为薄膜越厚,氧空位越多,而氧空位是对传感器功能起作用的缺陷。然而,薄膜厚度进一步增加,超过最佳点时,性能就会受到损害。这归因于薄膜内晶粒的生长,阻碍了其有效性。我们采用了 X 射线衍射 (XRD) 和场发射扫描电子显微镜 (FE-SEM) 来全面鉴定氧化镁薄膜的质量。这些技术为了解薄膜的晶体结构和形态提供了宝贵的信息,而晶体结构和形态是影响氢传感器性能的关键因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Study of MgZnO Thin Film for Hydrogen Sensing Application
This research introduces a hydrogen sensor made from a thin film of magnesium zinc oxide (MgZnO) deposited using a technique called radiofrequency co-sputtering (RF co-sputtering). Separate magnesium oxide (MgO) and zinc oxide (ZnO) targets were used to deposit the MgZnO film, experimenting with different deposition times and power levels. The sensor performed best (reaching a sensing response of 2.46) when exposed to hydrogen at a concentration of 1000 parts per million (ppm). This peak performance occurred with a MgZnO film thickness of 432 nanometers (nm) at a temperature of 300 °C. Initially, the sensor’s responsiveness increased as the film thickness grew. This is because thicker films tend to have more oxygen vacancies, which are imperfections that play a role in the sensor’s function. However, further increases in film thickness beyond the optimal point harmed performance. This is attributed to the growth of grains within the film, which hindered its effectiveness. X-ray diffraction (XRD) and field-emission scanning electron microscopy (FE-SEM) were employed to thoroughly characterize the quality of the MgZnO thin film. These techniques provided valuable insights into the film’s crystal structure and morphology, crucial factors influencing its performance as a hydrogen sensor.
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