用于高迁移率二维电子气的砷化镓和砷化铟异质结构的结构设计和分子束外延生长

Tiantian Wang, Huading Song, Ke He
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引用次数: 0

摘要

本综述旨在全面概述砷化镓和砷化铟异质结构的发展和当前认识,特别强调实现高材料质量和高迁移率的二维电子气(2DEG)。综述讨论了对提高电子迁移率有重大贡献的结构设计的演变,强调了对二维电子气散射机制的关键考虑。此外,本综述还探讨了分子束外延(MBE)对这些发展的重大贡献,特别是通过真空技术、源材料纯化和生长条件精确控制等方面的进步。本综述旨在为该领域的研究人员和从业人员提供有用的参考资料,让他们深入了解这些半导体系统的历史进程和技术细节。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Structural design and molecular beam epitaxy growth of GaAs and InAs heterostructures for high mobility two-dimensional electron gas

Structural design and molecular beam epitaxy growth of GaAs and InAs heterostructures for high mobility two-dimensional electron gas

This review aims to provide a comprehensive overview of the development and current understanding of GaAs and InAs heterostructures, with a special emphasis on achieving high material quality and high-mobility two-dimensional electron gases (2DEGs). The review discusses the evolution of structural designs that have significantly contributed to the enhancement of electron mobility, highlighting the critical considerations of scattering mechanisms of the 2DEGs. In addition, this review examines the substantial contributions of Molecular Beam Epitaxy (MBE) to these developments, particularly through advancements in vacuum technology, source material purification, and precision control of growth conditions. The intent of this review is to serve as a useful reference for researchers and practitioners in the field, offering insights into the historical progression and technical details of these semiconductor systems.

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