设计用于可见光光刻技术的全息聚光透镜

IF 1.3 4区计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC

IETE Journal of Research Pub Date : 2024-06-27 DOI:10.1080/03772063.2024.2368634

Shweta Yadav, Rashmi Sinha, Nirmalendu Deo, Vijay Nath

引用次数: 0

摘要

利用非线性可饱和吸收效应的概念，在 λ = 405 纳米波长的可见光下进行光刻，光斑的尺寸会减小到纳米级。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Design of Holographic Condenser Lens for Visible Light Lithography

Photolithography with visible light at λ = 405 nm utilizing the concept of nonlinear saturable absorption effect where the size of the spot is diminished to the nanometer scale as proposed by sever...

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来源期刊

IETE Journal of Research 工程技术-电信学

CiteScore

3.30

自引率

6.70%

发文量

308

期刊介绍： IETE Journal of Research is a Bimonthly journal published by the Institution of Electronics and Telecommunication Engineers (IETE), India. It publishes scientific and technical papers describing original research work or novel product/process development. Occasionally special issues are brought out on new and emerging research areas. IETE Journal of Research is useful to researchers, engineers, scientists, teachers, managers and students who are interested in keeping a track of original research and development work being carried out in the broad area of electronics, telecommunications, computer science and engineering and information technology.