{"title":"面向物理学和工程学本科生的自旋涂层实验和理论--与微加工的联系","authors":"M. Foster, J. Mendoza Cortes, H. C. Mayer","doi":"10.1119/5.0169090","DOIUrl":null,"url":null,"abstract":"Spin coating is a process by which thin and uniform layers of liquids are formed on substrates by rotation of the substrate at high speed. Production of these thin liquid layers, specifically using liquids called photoresists, is essential for photolithography in semiconductor and microelectronics processing whereby patterns are transferred and ultimately formed in layers on the substrate. With the surge in interest for increased domestic semiconductor processing capabilities, it makes sense that students in physics and engineering are provided with more knowledge of these processing techniques and how they rely on, among other things, traditional course work, and topics. Spin coating provides an excellent example to connect fluid dynamics with microfabrication. We present detailed experiments that can be performed in a college-level undergraduate laboratory, wherein students can explore both the variables appearing in a known model for spin coating in addition to investigating several of the variables related key assumptions used in the derivation of the model but which do not appear in the resulting equation.","PeriodicalId":7589,"journal":{"name":"American Journal of Physics","volume":null,"pages":null},"PeriodicalIF":0.8000,"publicationDate":"2024-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Spin coating experiments and theory for undergraduate physics and engineering students—A connection to microfabrication\",\"authors\":\"M. Foster, J. Mendoza Cortes, H. C. Mayer\",\"doi\":\"10.1119/5.0169090\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Spin coating is a process by which thin and uniform layers of liquids are formed on substrates by rotation of the substrate at high speed. Production of these thin liquid layers, specifically using liquids called photoresists, is essential for photolithography in semiconductor and microelectronics processing whereby patterns are transferred and ultimately formed in layers on the substrate. With the surge in interest for increased domestic semiconductor processing capabilities, it makes sense that students in physics and engineering are provided with more knowledge of these processing techniques and how they rely on, among other things, traditional course work, and topics. Spin coating provides an excellent example to connect fluid dynamics with microfabrication. We present detailed experiments that can be performed in a college-level undergraduate laboratory, wherein students can explore both the variables appearing in a known model for spin coating in addition to investigating several of the variables related key assumptions used in the derivation of the model but which do not appear in the resulting equation.\",\"PeriodicalId\":7589,\"journal\":{\"name\":\"American Journal of Physics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.8000,\"publicationDate\":\"2024-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"American Journal of Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1119/5.0169090\",\"RegionNum\":4,\"RegionCategory\":\"教育学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"EDUCATION, SCIENTIFIC DISCIPLINES\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"American Journal of Physics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1119/5.0169090","RegionNum":4,"RegionCategory":"教育学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"EDUCATION, SCIENTIFIC DISCIPLINES","Score":null,"Total":0}
Spin coating experiments and theory for undergraduate physics and engineering students—A connection to microfabrication
Spin coating is a process by which thin and uniform layers of liquids are formed on substrates by rotation of the substrate at high speed. Production of these thin liquid layers, specifically using liquids called photoresists, is essential for photolithography in semiconductor and microelectronics processing whereby patterns are transferred and ultimately formed in layers on the substrate. With the surge in interest for increased domestic semiconductor processing capabilities, it makes sense that students in physics and engineering are provided with more knowledge of these processing techniques and how they rely on, among other things, traditional course work, and topics. Spin coating provides an excellent example to connect fluid dynamics with microfabrication. We present detailed experiments that can be performed in a college-level undergraduate laboratory, wherein students can explore both the variables appearing in a known model for spin coating in addition to investigating several of the variables related key assumptions used in the derivation of the model but which do not appear in the resulting equation.
期刊介绍:
The mission of the American Journal of Physics (AJP) is to publish articles on the educational and cultural aspects of physics that are useful, interesting, and accessible to a diverse audience of physics students, educators, and researchers. Our audience generally reads outside their specialties to broaden their understanding of physics and to expand and enhance their pedagogical toolkits at the undergraduate and graduate levels.