工作物质导电率跳变的低频电容器(以 a-Si:H 为例)

N. Poklonski, I. I. Anikeev, S. A. Vyrko
{"title":"工作物质导电率跳变的低频电容器(以 a-Si:H 为例)","authors":"N. Poklonski, I. I. Anikeev, S. A. Vyrko","doi":"10.29235/1561-2430-2024-60-2-153-161","DOIUrl":null,"url":null,"abstract":"We propose a structural and electrical schemes of a capacitor based on a 3 μm thick a-Si:H (amorphous hydrogenated silicon) layer separated from the metal plates by 0.3 μm thick dielectric layers of SiO2 (silicon dioxide). We consider room temperatures (T ≈ 300 K) when in the absence of illumination for a-Si:H the hopping mechanism of electron migration via point defects of the structure prevails. For such a capacitor, the dependencies of the capacitance on the frequency of the measuring signal ω/2π in the range from 0.1 to 300 Hz are calculated for the a-Si:H layer with stationary hopping electrical conductivity σdc ≈ 1 ∙ 10−10 (Ohm ∙ cm)−1. It is assumed that there is no end-to-end electron transfer between the a-Si:H layer, dielectric layers and capacitor plates in the small-signal mode of capacitance measurement. It is shown that the real part of the capacitance of the capacitor decreases with increasing angular frequency ω, and the imaginary part is negative and depends non-monotonically on ω. The decrease in the real part of the device capacitance to the geometric capacitance of the series-connected oxide layers and the a-Si:H layer with increasing ω is due to a decrease in the electrical resistance of the capacitor. As a result, with increasing ω, the imaginary part of the capacitance is shunted by the hopping electrical conductivity of the capacitor. The phase shift for a sinusoidal electrical signal supplied to the capacitor is determined depending on the frequency ω/2π in the range of 0.1–300 Hz for the values of electrical conductivities of the hydrogenated amorphous silicon layer σdc ≈ 1 ∙ 10−11, 1 ∙ 10−10, and 1 ∙ 10−9 (Ohm ∙ cm)−1 at the temperature 300 K. With an increase in the electrical conductivity σdc of the a-Si:H layer, the minimum absolute value of the phase shift angle (≈65°) shifts to the high- frequency region (from 1 to 100 Hz). The proposed low-frequency capacitor can find application in electrical circuits for detecting low-frequency electrical signals for the purposes of biomedicine.","PeriodicalId":516297,"journal":{"name":"Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series","volume":"96 2","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Low-frequency capacitor with hopping electrical conductivity of the working substance (on the example of a-Si:H)\",\"authors\":\"N. Poklonski, I. I. Anikeev, S. A. Vyrko\",\"doi\":\"10.29235/1561-2430-2024-60-2-153-161\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We propose a structural and electrical schemes of a capacitor based on a 3 μm thick a-Si:H (amorphous hydrogenated silicon) layer separated from the metal plates by 0.3 μm thick dielectric layers of SiO2 (silicon dioxide). We consider room temperatures (T ≈ 300 K) when in the absence of illumination for a-Si:H the hopping mechanism of electron migration via point defects of the structure prevails. For such a capacitor, the dependencies of the capacitance on the frequency of the measuring signal ω/2π in the range from 0.1 to 300 Hz are calculated for the a-Si:H layer with stationary hopping electrical conductivity σdc ≈ 1 ∙ 10−10 (Ohm ∙ cm)−1. It is assumed that there is no end-to-end electron transfer between the a-Si:H layer, dielectric layers and capacitor plates in the small-signal mode of capacitance measurement. It is shown that the real part of the capacitance of the capacitor decreases with increasing angular frequency ω, and the imaginary part is negative and depends non-monotonically on ω. The decrease in the real part of the device capacitance to the geometric capacitance of the series-connected oxide layers and the a-Si:H layer with increasing ω is due to a decrease in the electrical resistance of the capacitor. As a result, with increasing ω, the imaginary part of the capacitance is shunted by the hopping electrical conductivity of the capacitor. The phase shift for a sinusoidal electrical signal supplied to the capacitor is determined depending on the frequency ω/2π in the range of 0.1–300 Hz for the values of electrical conductivities of the hydrogenated amorphous silicon layer σdc ≈ 1 ∙ 10−11, 1 ∙ 10−10, and 1 ∙ 10−9 (Ohm ∙ cm)−1 at the temperature 300 K. With an increase in the electrical conductivity σdc of the a-Si:H layer, the minimum absolute value of the phase shift angle (≈65°) shifts to the high- frequency region (from 1 to 100 Hz). The proposed low-frequency capacitor can find application in electrical circuits for detecting low-frequency electrical signals for the purposes of biomedicine.\",\"PeriodicalId\":516297,\"journal\":{\"name\":\"Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series\",\"volume\":\"96 2\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-07-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.29235/1561-2430-2024-60-2-153-161\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.29235/1561-2430-2024-60-2-153-161","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

我们提出了一种电容器的结构和电气方案,该电容器基于 3 μm 厚的 a-Si:H(非晶氢化硅)层,该层由 0.3 μm 厚的二氧化硅(SiO2)介质层与金属板隔开。我们考虑的是室温(T ≈ 300 K)条件下,在没有光照的情况下,a-Si:H 电子通过结构点缺陷迁移的跳变机制占主导地位。对于这种电容器,我们计算了在 0.1 至 300 Hz 范围内电容与测量信号频率 ω/2π 的关系,a-Si:H 层的静态跳变导电率 σdc ≈ 1 ∙ 10-10 (Ohm∙ cm)-1。假设在电容测量的小信号模式下,a-Si:H 层、介质层和电容器板之间不存在端对端电子转移。结果表明,电容器电容的实部随角频率 ω 的增加而减小,虚部为负,并且与 ω 非单调相关。器件电容的实部与串联氧化物层和 a-Si:H 层的几何电容的比值随 ω 的增大而减小,这是因为电容器的电阻减小了。因此,随着 ω 的增大,电容的虚部被电容的跳电导率分流。在温度为 300 K 时,氢化非晶硅层的导电率 σdc ≈ 1 ∙ 10-11、1 ∙ 10-10 和 1 ∙ 10-9 (Ohm ∙ cm)-1 的范围内,根据频率 ω/2π 确定电容器正弦电信号的相移。随着 a-Si:H 层电导率 σdc 的增加,相移角的最小绝对值(≈65°)转移到了高频区域(1 至 100 Hz)。所提出的低频电容器可应用于检测低频电信号的电路中,从而达到生物医学的目的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low-frequency capacitor with hopping electrical conductivity of the working substance (on the example of a-Si:H)
We propose a structural and electrical schemes of a capacitor based on a 3 μm thick a-Si:H (amorphous hydrogenated silicon) layer separated from the metal plates by 0.3 μm thick dielectric layers of SiO2 (silicon dioxide). We consider room temperatures (T ≈ 300 K) when in the absence of illumination for a-Si:H the hopping mechanism of electron migration via point defects of the structure prevails. For such a capacitor, the dependencies of the capacitance on the frequency of the measuring signal ω/2π in the range from 0.1 to 300 Hz are calculated for the a-Si:H layer with stationary hopping electrical conductivity σdc ≈ 1 ∙ 10−10 (Ohm ∙ cm)−1. It is assumed that there is no end-to-end electron transfer between the a-Si:H layer, dielectric layers and capacitor plates in the small-signal mode of capacitance measurement. It is shown that the real part of the capacitance of the capacitor decreases with increasing angular frequency ω, and the imaginary part is negative and depends non-monotonically on ω. The decrease in the real part of the device capacitance to the geometric capacitance of the series-connected oxide layers and the a-Si:H layer with increasing ω is due to a decrease in the electrical resistance of the capacitor. As a result, with increasing ω, the imaginary part of the capacitance is shunted by the hopping electrical conductivity of the capacitor. The phase shift for a sinusoidal electrical signal supplied to the capacitor is determined depending on the frequency ω/2π in the range of 0.1–300 Hz for the values of electrical conductivities of the hydrogenated amorphous silicon layer σdc ≈ 1 ∙ 10−11, 1 ∙ 10−10, and 1 ∙ 10−9 (Ohm ∙ cm)−1 at the temperature 300 K. With an increase in the electrical conductivity σdc of the a-Si:H layer, the minimum absolute value of the phase shift angle (≈65°) shifts to the high- frequency region (from 1 to 100 Hz). The proposed low-frequency capacitor can find application in electrical circuits for detecting low-frequency electrical signals for the purposes of biomedicine.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
CiteScore
0.50
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信