基于堆叠故障扩展的辐照碳化硅结势垒肖特基二极管泄漏电流劣化研究

Maojiu Luo, Yourun Zhang, Yucheng Wang, Hang Chen, Rong Zhou, Zhi Wang, Chao Lu, Bo Zhang
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摘要

为了探索重离子辐照下碳化硅结势垒肖特基二极管(JBS)漏电流的衰减机制,我们进行了一项全面的研究。根据实验结果,我们提出并验证了辐照过程中大量电子-空穴对重组引起的堆叠断层(SFs)的产生是导致反向漏电流劣化的原因。辐照实验是基于线性能量转移(LET)为 90.5 MeV/(mg/cm2)的 Ta 离子进行的。实验结果表明,当偏压为额定反向电压的 20% 时,二极管的漏电流在辐照过程中会永久性增加。我们利用微聚光光谱和聚光微成像技术检测了辐照后的碳化硅 JBS 二极管中是否存在 SFs。我们将辐照样品的性能退化与重离子辐照引入的 SFs 结合起来。最后,我们利用三维 TCAD 仿真评估了重离子辐照激发的过量电子-空穴对(EHPs)浓度。结果表明,辐照下的过量空穴浓度大大超过了基底中 SFs 膨胀所需的阈值空穴浓度。所提出的机制表明,应考虑碳化硅的工艺和材料特性,以加强碳化硅功率器件的单事件效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of the Leakage Current Degradation Based on Stacking Faults Expansion in Irradiated SiC Junction Barrier Schottky Diodes
A comprehensive investigation was conducted to explore the degradation mechanism of leakage current in SiC junction barrier Schottky (JBS) diodes under heavy ion irradiation. We propose and verify that the generation of stacking faults (SFs) induced by the recombination of massive electron-hole pairs during irradiation is the cause of reverse leakage current degradation based on experiments results. The irradiation experiment was carried out based on Ta ions with high linear energy transfer (LET) of 90.5 MeV/(mg/cm2). It is observed that the leakage current of the diode undergoes the permanent increase during irradiation when biased at 20% of the rated reverse voltage. Micro-PL spectroscopy and PL micro-imaging were utilized to detect the presence of SFs in the irradiated SiC JBS diodes. We combined the degraded performance of irradiated samples with SFs introduced by heavy ion irradiation. Finally, 3D TCAD simulation was employed to evaluate the excessive electron-hole pairs (EHPs) concentration excited by heavy ion irradiation. It was observed that the excessive hole concentration under irradiation exceeded significantly the threshold hole concentration necessary for the expansion of SFs in the substrate. The proposed mechanism suggests that the process and material characteristics of the silicon carbide should be considered in order to reinforcing against the single event effect of SiC power devices.
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