Chenyi Qu, Mengqing Hong, Guo Wei, Wentao Ge, Enkai Guo, Fen Zhong, Guangxu Cai, Yongqiang Wang and Feng Ren
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引用次数: 0
摘要
面向等离子体的材料（PFM）的性能是严重影响聚变反应堆运行稳定性的关键因素之一。本文设计了一种新型 CrMoTaWV/W（高熵合金 (HEA)/W) 多层结构作为 PFM，以研究其抗 He 等离子体辐照的性能。结果表明，界面的引入有效地吸收了大量 He 原子，阻止了它们向材料内部的扩散，延缓了模糊孕育区的形成，从而增强了抗等离子辐照的能力。据观察，HEA/W 多层薄膜中转变为毛刺的厚度约为 CrMoTaWV（HEA）薄膜的三分之二。此外，HEA/W 多层薄膜中绒毛的生长率低于 W 和 HEA 薄膜的平均生长率之和。这些发现为探索高性能 PFM 指明了一条大有可为的新途径。
Interfaces enhanced plasma irradiation resistance in CrMoTaWV/W multilayer films through blocking He diffusion
The performance of plasma-facing materials (PFMs) is one of the key factors that significantly impact the stability of operation in fusion reactors. Herein, a new CrMoTaWV/W (high entropy alloy (HEA)/W) multilayer structure is designed as PFM to investigate its resistance to He plasma irradiation. It was observed that the introduction of the interfaces effectively absorbed plenty of He atoms, preventing them from diffusing into the material and delaying the formation of fuzz incubation zone, therefore, enhancing the resistance to plasma irradiation. The thickness transformed to fuzz in the HEA/W multilayer films was observed to be about two-thirds of those in the CrMoTaWV (HEA) film. Additionally, the fuzz growth rates in HEA/W multilayer films are lower than the average growth rate of bulk W and HEA films combined. These findings highlight a promising new avenue for the exploration of high-performance PFMs.
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