{"title":"下一代微电子等离子体研究的指导原则","authors":"A. Thompson","doi":"10.1063/10.0026320","DOIUrl":null,"url":null,"abstract":"Plasma applications, essential for semiconductor device manufacturing, must overcome several challenges to continue to drive progress.","PeriodicalId":507346,"journal":{"name":"Scilight","volume":"34 46","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Guiding principles for next generation of plasma research for microelectronics\",\"authors\":\"A. Thompson\",\"doi\":\"10.1063/10.0026320\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Plasma applications, essential for semiconductor device manufacturing, must overcome several challenges to continue to drive progress.\",\"PeriodicalId\":507346,\"journal\":{\"name\":\"Scilight\",\"volume\":\"34 46\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-06-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Scilight\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1063/10.0026320\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Scilight","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/10.0026320","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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