Ding Hu, Shaojun Liang, Yichun He, Rensheng Zhang, Song Yue
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引用次数: 0
摘要
在 2 至 5 Pa 的不同工作压力下沉积的 p 型 Bi0.5Sb1.5Te3 柔性薄膜上,研究了磁控溅射过程中氩气工作压力对热电特性的影响。由于氩离子对溅射出的 Bi、Sb 和 Te 原子的沉积具有尺寸抑制作用,因此微观结构和取向、原子成分和载流子浓度可通过调节工作压力来调节。由于出现了 (006) 取向、最接近的化学计量比、最高的载流子浓度和迁移率以及量子约束效应,在 4 Pa 下沉积的薄膜在 360 K 时显示出 1095 μW m-1 K-2 的最大功率因数。
Effects of working pressure during magnetron sputtering on thermoelectric performance of flexible p-type Bi0.5Sb1.5Te3 thin films
The influence of argon working pressure during magnetron sputtering on thermoelectric properties has been investigated on p-type Bi0.5Sb1.5Te3 flexible films deposited at various working pressures in the range from 2 to 5 Pa. The microstructure and orientations, atomic compositions, and carrier concentration could be regulated by adjusting the working pressure, due to the size-dependent inhibition of the deposition of the sputtered Bi, Sb, and Te atoms from argon ions. Profiting from the occurrence of the (006) orientation, the nearest stoichiometric ratio, the highest carrier concentration and mobility, and the quantum confinement effect, the film deposited at 4 Pa displays the maximum power factor of 1095 μW m−1 K−2 at 360 K. These results suggest that the electrical transport properties of the sputtered flexible thermoelectric thin films can be synergistically optimized by selecting an appropriate working pressure.