p-GaN 栅 AlGaN/GaN HEMT 在不同离态漏极电压和 ON 态漏极电流条件下进行双脉冲测试后的阈值电压不稳定性

Chih-wei Chen, Hao-Hsuan Lo, Y. Hsin
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引用次数: 0

摘要

本研究通过在导通和关断状态使用脉冲宽度为 1µs 的双脉冲测试 (DPT),研究了肖特基 p-GaN 栅 AlGaN/GaN 高电子迁移率晶体管 (HEMT) 的阈值电压 (VTH) 不稳定性。在 DPT 中施加了 100-400 V 的关态漏极偏置 (VDS,OFF) 和 1-16 A 的导通态漏极电流 ID,ON,以观察 DPT 后的 VTH 漂移。在 DPT 之后,导通态电流对器件特性的影响不大。然而,关断态电压,尤其是 VDS,OFF = 100 和 200 V,却产生了显著的影响。我们进行了 TCAD 仿真,以研究在不同 VDS,OFF 和 ID,ON 电平下 DPT 后 VTH 漂移的基本机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Threshold Voltage Instability After Double Pulse Test Under Different OFF-State Drain Voltages and ON-State Drain Currents in p-GaN Gate AlGaN/GaN HEMT
This study investigated threshold voltage (VTH) instability in a Schottky p-GaN gate AlGaN/GaN high-electron-mobility transistor (HEMT) by using the double pulse test (DPT) with a 1-µs pulse width in the ON-state and OFF-state. OFF-state drain biases (VDS,OFF) of 100–400 V and ON-state drain currents of ID,ON 1–16 A were applied in the DPT to observe the post-DPT VTH shift. The ON-state currents did not strongly influence the device's characteristics after the DPT. However, the OFF-state voltages, particularly VDS,OFF = 100 and 200 V, exerted notable effects. A TCAD simulation was conducted to investigate the mechanism underlying the VTH shift after the DPT at various VDS,OFF and ID,ON levels.
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