通过单轴应变调节氟和氢钝化二维 Ga2O3 的电子、传输和光学特性

Hui Zeng, Meng Wu, Chao Ma, Xi Fu, Haixia Gao
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引用次数: 0

摘要

二维(2D)半导体在面向未来的光电应用中展现了巨大的前景,而传统 2D 材料的应用却因电子迁移率低(≤ 200 cm2V1s1)而受到严重阻碍。在这项工作中,通过使用 Heyd-Scuseria-Ernzerh (HSE) 和 Perdew-Burke-Ernzerhof (PBE) 函数进行第一原理计算,探索了应变介导的氟和氢钝化二维 Ga2O3 系统 (FGa2O3H)。我们的结果表明,当单轴拉伸应变达到 6% 时,FGa2O3H 的电子迁移率高达 4863.05 cm2V1s1,这可归因于波函数和成键特征重叠的增强。总的来说,从压缩到拉伸,沿a(b)方向施加单轴应变,二维FGa2O3H的带隙先增大后减小,这是由于随着Ga-O键的延长,CBM中的σ*反键和VBM中的π键状态发生了变化。此外,当拉伸应变大于 8%时,G 点更强的π键导致了间接到直接的转变。拉伸应变为 6% 时,n 型掺杂二维 FGa2O3H 的电子迁移率最高,此外,其导电性也得到增强,并随着温度从 300K 升高到 800K 而进一步提高。随着拉伸应变从 0% 增加到 6%,紫外区吸收系数的变化可以忽略不计,这为其在大功率光电器件中的应用提供了启示。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Tunable Electronic, Transport, and Optical Properties of Fluorine and Hydrogen Passivated Two-Dimensional Ga2O3 by Uniaxial Strain
Two-dimensional (2D) semiconductors have shown great prospect in future-oriented optoelectronic applications, whereas the applications of conventional 2D materials are significantly impeded by the low electron mobility (≤ 200 cm2V1s1). In this work, strain mediated fluorine and hydrogen passivated 2D Ga2O3 systems (FGa2O3H) have been explored via using first-principles calculations with the Heyd-Scuseria-Ernzerh (HSE) and Perdew-Burke-Ernzerhof (PBE) functional. Our results reveal a considerable high electron mobility of FGa2O3H up to 4863.05 cm2V1s1 as the uniaxial tensile strain reaches 6%, which can be attributed to the enhanced overlapping of wave functions and bonding features. Overall, applying the uniaxial strain monotonously along a(b) direction from compressive to tensile cases, the bandgaps of 2D FGa2O3H increase initially and then decrease, which is originated from the changes of σ* anti-bonding in the CBM and π bonding states in the VBM accompanying with the lengthening Ga-O bonds. Additionally, when the tensile strain is larger than 8%, the stronger π bonding at G point leads to an indirect-to-direct transition. Besides the highest electron mobility of n-type doped 2D FGa2O3H with 6% tensile strain, the electrical conductivity is enhanced and further elevated with the temperature increase from 300K to 800K. The variations of the absorption coefficient in the ultraviolet region is negligible with the increasing tensile strain from 0% to 6%, shed light on its applications in high-power optoelectronic devices.
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