Lise Watrin, François Silva, Cyril Jadaud, P. Bulkin, J. Vanel, Dominique Muller, Erik V Johnson, Karim Ouaras, P. Roca i Cabarrocas
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引用次数: 0
摘要
我们报告了利用远程等离子体化学气相沉积(RP-CVD)技术在硅(100)基底上低温(500°C)、低压(0.3 毫巴)直接生长 GaN 薄膜的情况。在定制设计的反应器中,射频电感耦合等离子体 (ICP) 在远离基底区域的地方产生,以促进 V 族前驱体 N2 与添加的 H2 的分解,而 III 族前驱体三甲基镓 (TMGa) 则与 H2 载气混合直接注入生长室。对射频功率、工艺压力和气体流速等生长参数进行了优化,以达到约 0.6 µm/h 的薄膜生长速度。我们使用了多种表征技术来研究等离子体和生长薄膜在结晶度、形态、形貌和成分方面的特性。薄膜的纹理非常清晰,并沿着乌兹结构的 c 轴优先取向。薄膜的粗糙度在纳米范围内较小,呈柱状微结构,晶粒大小为 100 纳米,镓极性(+c 平面定向)。RBS 和 NRA 分析表明,整个层深度的化学成分是均匀的,III/V 比率接近 1,氧含量非常低(低于检测限 ~1%),碳含量高达 11%。研究表明,等离子体功率的增加有助于将碳污染降低到 8%。这项研究为降低 III-V 薄膜生产成本的生长方法铺平了道路,通过在低压下进行 RP-CVD 操作可减少气体消耗。
Direct growth of highly oriented GaN thin films on silicon by remote plasma CVD
We report on low-temperature (500°C) and low-pressure (0.3 mbar) direct growth of GaN thin films on silicon (100) substrates using Remote Plasma Chemical Vapor Deposition (RP-CVD). In the custom-designed reactor, an RF Inductively Coupled Plasma (ICP) is generated remotely from the substrate's area to facilitate the decomposition of group-V precursor, N2 with added H2, while group-III precursor Trimethylgallium (TMGa), is directly injected into the growth chamber mixed with H2 carrier gas. Growth parameters such as RF power, process pressure and gas flow rates have been optimized to achieve a film growth rate of about 0.6 µm/h. Several characterization techniques were used to investigate the plasma and the properties of the grown thin films in terms of their crystallinity, morphology, topography, and composition. The films are highly textured with a preferential orientation along the c-axis of the wurtzite structure. They present a small roughness in the nanometer range and a columnar microstructure with a grain size of one hundred nanometers, and a gallium polarity (+c plane oriented). RBS and NRA analysis show that the chemical composition is homogeneous through the depth of the layer, with a III/V ratio close to 1, a very low content of oxygen (below the detection limit ~1%) and a carbon content up to 11%. It was shown that that the increase of plasma power helps to reduce this carbon contamination down to 8%. This research paves the way for a growth method compatible with cost reduction of III-V thin film production achieved through reduced gas consumption facilitated by RP-CVD operation at low pressure.