窄带 Mg/SiC 多层反射镜可用作 30.4 纳米波长的高次谐波选择器

IF 2 4区物理与天体物理 Q3 OPTICS

Journal of Optics Pub Date : 2024-04-11 DOI:10.1088/2040-8986/ad3a79

Zhe Zhang, Runze Qi, Qiushi Huang, Yufei Feng, Zhong Zhang, Tonglin Huo, Hongjun Zhou, Zhanshan Wang

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引用次数: 0

摘要

多层膜（ML）是选择单波长辐射的高次谐波发生（HHG）源的良好选择。我们设计并制造了基于高布拉格阶反射的工作波长在 30.4 纳米左右、带宽显著降低的多层膜。使用掠入射 X 射线反射仪、极紫外反射率和本征应力测量法对窄带 ML 进行了表征。结果表明，采用第三布拉格阶设计的 Mg/SiC ML 在近正常入射几何条件下，最窄带宽为 0.71 nm（全宽半最大值），光谱分辨率（λ/Δλ）为 42，反射率为 30%。基于这些结果，对在大入射角下工作的窄带 ML 的模拟表明，对于 HHG 光源，第 3 勃拉格阶 ML 与第 1 勃拉格阶 ML 相比具有更好的光谱选择性。

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Narrowband Mg/SiC multilayer mirror working as high-harmonic selector at 30.4 nm wavelength

Multilayers (MLs) are a good choice for high-harmonic generation (HHG) sources for selecting single-wavelength radiation. MLs working around 30.4 nm with a significantly reduced bandwidth based on high Bragg order reflection have been designed and fabricated. The narrowband MLs were characterized using grazing incidence x-ray reflectometry, extreme ultraviolet reflectivity, and intrinsic stress measurements. The results indicate that Mg/SiC MLs designed with 3rd Bragg order have narrowest bandwidth of 0.71 nm (full width half maximum) with a spectral resolution (λ/Δλ) of 42, and reflectance of 30% under near normal incidence geometry. Based on these results, the simulation of narrowband MLs working at large incident angles demonstrates that 3rd Bragg order ML has a better spectral selectivity compared with 1st Bragg order ML for HHG sources.

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来源期刊

Journal of Optics OPTICS-

CiteScore

4.50

自引率

4.80%

发文量

237

审稿时长

1.9 months

期刊介绍： Journal of Optics publishes new experimental and theoretical research across all areas of pure and applied optics, both modern and classical. Research areas are categorised as: Nanophotonics and plasmonics Metamaterials and structured photonic materials Quantum photonics Biophotonics Light-matter interactions Nonlinear and ultrafast optics Propagation, diffraction and scattering Optical communication Integrated optics Photovoltaics and energy harvesting We discourage incremental advances, purely numerical simulations without any validation, or research without a strong optics advance, e.g. computer algorithms applied to optical and imaging processes, equipment designs or material fabrication.