1375 ℃条件下不同氧分压下β-Ga2O3单晶中的氧扩散

Johanna Uhlendorf, Harald Schmidt
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引用次数: 0

摘要

氧化镓的单斜β多晶体是一种具有超宽带隙的半导体。它在各种技术应用中的重要性与日俱增。我们研究了在 1375 °C 温度下,β-Ga2O3 单晶中氧的示踪自扩散与氧分压(2、20 和 200 毫巴)的函数关系。使用同位素富集的 18O2 气体作为示踪源,并使用二次离子质谱分析深度剖面。我们观察到,随着氧分压的降低,特定温度下的扩散率显著增加。我们认为,这种行为可以用从氧间隙到氧空位的扩散机制变化来解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Oxygen diffusion in β-Ga2O3 single crystals under different oxygen partial pressures at 1375 °C
The monoclinic β-polymorph of gallium oxide is a semiconductor with an ultra-wide bandgap. It is becoming increasingly significant for various technological applications. We have investigated the tracer self-diffusion of oxygen in β-Ga2O3 single crystals as a function of the oxygen partial pressure (2, 20 and 200 mbar) at a temperature of 1375 °C. Isotopically enriched 18O2 gas was used as a tracer source and secondary ion mass spectrometry to analyze depth profiles. We observed that, with decreasing oxygen partial pressure, the diffusivities at a given temperature increase significantly. We suggest that this behaviour can be explained by a change in the diffusion mechanism from oxygen interstitials to oxygen vacancies.
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