Buse Akkaya, Jiyan Aslan, Rukiye Taşdemi̇r, İlker Erdem, Mehmet Gönen
{"title":"用硅酸钠树脂生产胶体二氧化硅及优化工艺","authors":"Buse Akkaya, Jiyan Aslan, Rukiye Taşdemi̇r, İlker Erdem, Mehmet Gönen","doi":"10.56171/ojn.1402531","DOIUrl":null,"url":null,"abstract":"Colloidal silica is a stable and homogeneously dispersed form of amorphous silicon dioxide (SiO2) nanoparticles in water. Colloidal silica has been the focus of research due to large surface area, biocompatibility, low toxicity and chemical and thermal stability. It has been used in a wide variety of industrial applications, including pulp and paper, chromatography, electronics, foods, and colloids, as well as in the ceramics and glass industry. In this study, colloidal silica was produced using cationic resin and sodium silicate and process conditions were optimized. Temperature (50-80 °C), mixing speed (200-500 rpm) and time (20-120 min.), which significantly affect the particle size, were selected as parameters. Particle size distribution (PSD) analyzes of colloidal silica particles were performed to determine appropriate levels of the parameters. The most suitable process conditions are 50°C temperature, 40 min. and 300 rpm. The average particle size of colloidal silica produced in optimum conditions was measured as 80 nm.","PeriodicalId":448411,"journal":{"name":"Open Journal of Nano","volume":"29 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Colloidal Silica Production with Resin from Sodium Silicate and Optimization of Process\",\"authors\":\"Buse Akkaya, Jiyan Aslan, Rukiye Taşdemi̇r, İlker Erdem, Mehmet Gönen\",\"doi\":\"10.56171/ojn.1402531\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Colloidal silica is a stable and homogeneously dispersed form of amorphous silicon dioxide (SiO2) nanoparticles in water. Colloidal silica has been the focus of research due to large surface area, biocompatibility, low toxicity and chemical and thermal stability. It has been used in a wide variety of industrial applications, including pulp and paper, chromatography, electronics, foods, and colloids, as well as in the ceramics and glass industry. In this study, colloidal silica was produced using cationic resin and sodium silicate and process conditions were optimized. Temperature (50-80 °C), mixing speed (200-500 rpm) and time (20-120 min.), which significantly affect the particle size, were selected as parameters. Particle size distribution (PSD) analyzes of colloidal silica particles were performed to determine appropriate levels of the parameters. The most suitable process conditions are 50°C temperature, 40 min. and 300 rpm. The average particle size of colloidal silica produced in optimum conditions was measured as 80 nm.\",\"PeriodicalId\":448411,\"journal\":{\"name\":\"Open Journal of Nano\",\"volume\":\"29 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Open Journal of Nano\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.56171/ojn.1402531\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Open Journal of Nano","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.56171/ojn.1402531","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Colloidal Silica Production with Resin from Sodium Silicate and Optimization of Process
Colloidal silica is a stable and homogeneously dispersed form of amorphous silicon dioxide (SiO2) nanoparticles in water. Colloidal silica has been the focus of research due to large surface area, biocompatibility, low toxicity and chemical and thermal stability. It has been used in a wide variety of industrial applications, including pulp and paper, chromatography, electronics, foods, and colloids, as well as in the ceramics and glass industry. In this study, colloidal silica was produced using cationic resin and sodium silicate and process conditions were optimized. Temperature (50-80 °C), mixing speed (200-500 rpm) and time (20-120 min.), which significantly affect the particle size, were selected as parameters. Particle size distribution (PSD) analyzes of colloidal silica particles were performed to determine appropriate levels of the parameters. The most suitable process conditions are 50°C temperature, 40 min. and 300 rpm. The average particle size of colloidal silica produced in optimum conditions was measured as 80 nm.