屈曲结构--薄膜/基底系统机械特性的相关特征

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引用次数: 0

摘要

薄膜和涂层被广泛应用于微电子、包装或光学等技术领域。在沉积过程中,它们通常会产生很高的残余应力,有时压缩应力高达几 GPa。这种巨大的压缩应力可能会导致屈曲结构的成核和生长,通常会导致这类薄膜/基底复合材料丧失最初赋予的功能特性。因此,我们研究的目的是通过确定相关参数来防止、限制或控制屈曲现象的发生,从而更好地了解屈曲现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Buckling Structures, A Relevant Signature of the Mechanical Properties of Film/Substrate Systems
Thin films and coatings are used in a wide range of technological applications, such as microelectronics, packaging or optics. They often develop high residual stresses during the deposition process, sometimes about few GPa in compression. Such large compressive stresses may cause the nucleation and growth of buckling structures that generally result in the loss of functional properties that were initially conferred to such film/substrate composites. The aim of our studies is consequently to have a better understanding of the buckling phenomenon, by identifying the relevant parameters to prevent, to limit, or to control its occurrence.
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