利用 VASE 建模确定 PMMA 的蚀刻速率

{"title":"利用 VASE 建模确定 PMMA 的蚀刻速率","authors":"Victor Vazquez, Zachary Kranefeld, John H. McElearney, T. Vandervelde","doi":"10.1117/12.3002035","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":517975,"journal":{"name":"Physics and Simulation of Optoelectronic Devices XXXII","volume":"51 2","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Determination of PMMA etch rates using VASE modeling\",\"authors\":\"Victor Vazquez, Zachary Kranefeld, John H. McElearney, T. Vandervelde\",\"doi\":\"10.1117/12.3002035\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":517975,\"journal\":{\"name\":\"Physics and Simulation of Optoelectronic Devices XXXII\",\"volume\":\"51 2\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-03-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physics and Simulation of Optoelectronic Devices XXXII\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.3002035\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physics and Simulation of Optoelectronic Devices XXXII","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.3002035","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}