栅极功函数对使用 Sentaurus TCAD 软件模拟的 MOS 太阳能电池实验 I-V 特性的影响

Q4 Engineering
F. Izumi, Marcos Norio Watanabe, Bárbara Siano Alandia, S. G. dos Santos Filho
{"title":"栅极功函数对使用 Sentaurus TCAD 软件模拟的 MOS 太阳能电池实验 I-V 特性的影响","authors":"F. Izumi, Marcos Norio Watanabe, Bárbara Siano Alandia, S. G. dos Santos Filho","doi":"10.29292/jics.v19i1.700","DOIUrl":null,"url":null,"abstract":"In this work, the influence of gate work function on the experimental J-VG characteristics of MOS solar cells was investigated with the aid of the Sentaurus TCAD for 2D numer-ical simulations of TiN/SiOxNy/Si Al/SiOxNy/Si and Al/MgO/Mg/SiOxNy/Si structures aiming at solar cells for en-ergy harvesting applications. The increase of the gate work function led to the increase of the reverse current density as pointed out by the Sentaurus TCAD simulations and by the ex-perimental J-VG characteristics. The work functions of Mg, Al, and un-annealed TiN used in the TCAD simulations were 3.7 eV, 4.1 eV, and 4.4 eV, respectively. It was observed that the onset voltage at 0.5 mA/cm2 in the forward-biasing region was at a lower voltage for TiN (~ - 0.06 V) compared to Al (~ - 0.42 V) and the Al/MgO/Mg stack (~ - 0.47 V). On the other hand, the current density increased steeply in the forward biasing for TiN and Al compared to the Al/ MgO/Mg stack gate and the thin MgO layer between Al and Mg worked as a potential barrier in an opposite direction to the potential barrier of the Mg/Si-OxNy/Si structure, which meant an onset voltage lowering for the Al/MgO/Mg/SiOxNy/Si solar cell. For the Al/MgO/Mg stack, the barrier effect of the MgO layer was fitted as a series re-sistance RS = 100 Ω and an equivalent Al/MgO/Mg work func-tion of 4.15 eV considering a substrate doping NA = 1.2x1016 cm-3 and parallel conductance GP = 0. Also, the experimental JxVG characteristic of the Al/SiOxNy/Si cell was fitted for Al work function of 4.10 eV, a series resistance RS = 100 Ω, a parallel resistance RP = 0.02 Ω (GP = 50 S) and a substrate doping NA = 5.5x1015 cm-3. In this case, the high parallel conductance fitted was attributed to the tunneling through the dielectrics as a pre-dominant effect possibly caused by a high concentration of de-fects in the SiOxNy layer. Finally, the MOS solar cell parameters were relatively lower compared to those of commercial outdoor solar cells, but the power generated by the MOS cells reached the mW range, and the conversion efficiency from light energy into electrical energy was higher (12.7%) than the typical values found for energy-harvesting solar cells.","PeriodicalId":39974,"journal":{"name":"Journal of Integrated Circuits and Systems","volume":" 30","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Impact of the gate work function on the experimental I-V characteristics of MOS solar cells simulated with the Sentaurus TCAD software\",\"authors\":\"F. Izumi, Marcos Norio Watanabe, Bárbara Siano Alandia, S. G. dos Santos Filho\",\"doi\":\"10.29292/jics.v19i1.700\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, the influence of gate work function on the experimental J-VG characteristics of MOS solar cells was investigated with the aid of the Sentaurus TCAD for 2D numer-ical simulations of TiN/SiOxNy/Si Al/SiOxNy/Si and Al/MgO/Mg/SiOxNy/Si structures aiming at solar cells for en-ergy harvesting applications. The increase of the gate work function led to the increase of the reverse current density as pointed out by the Sentaurus TCAD simulations and by the ex-perimental J-VG characteristics. The work functions of Mg, Al, and un-annealed TiN used in the TCAD simulations were 3.7 eV, 4.1 eV, and 4.4 eV, respectively. It was observed that the onset voltage at 0.5 mA/cm2 in the forward-biasing region was at a lower voltage for TiN (~ - 0.06 V) compared to Al (~ - 0.42 V) and the Al/MgO/Mg stack (~ - 0.47 V). On the other hand, the current density increased steeply in the forward biasing for TiN and Al compared to the Al/ MgO/Mg stack gate and the thin MgO layer between Al and Mg worked as a potential barrier in an opposite direction to the potential barrier of the Mg/Si-OxNy/Si structure, which meant an onset voltage lowering for the Al/MgO/Mg/SiOxNy/Si solar cell. For the Al/MgO/Mg stack, the barrier effect of the MgO layer was fitted as a series re-sistance RS = 100 Ω and an equivalent Al/MgO/Mg work func-tion of 4.15 eV considering a substrate doping NA = 1.2x1016 cm-3 and parallel conductance GP = 0. Also, the experimental JxVG characteristic of the Al/SiOxNy/Si cell was fitted for Al work function of 4.10 eV, a series resistance RS = 100 Ω, a parallel resistance RP = 0.02 Ω (GP = 50 S) and a substrate doping NA = 5.5x1015 cm-3. In this case, the high parallel conductance fitted was attributed to the tunneling through the dielectrics as a pre-dominant effect possibly caused by a high concentration of de-fects in the SiOxNy layer. Finally, the MOS solar cell parameters were relatively lower compared to those of commercial outdoor solar cells, but the power generated by the MOS cells reached the mW range, and the conversion efficiency from light energy into electrical energy was higher (12.7%) than the typical values found for energy-harvesting solar cells.\",\"PeriodicalId\":39974,\"journal\":{\"name\":\"Journal of Integrated Circuits and Systems\",\"volume\":\" 30\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-03-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Integrated Circuits and Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.29292/jics.v19i1.700\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Integrated Circuits and Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.29292/jics.v19i1.700","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 0

摘要

在这项工作中,我们借助 Sentaurus TCAD 对 TiN/SiOxNy/Si Al/SiOxNy/Si 和 Al/MgO/Mg/SiOxNy/Si 结构进行了二维数值模拟,研究了栅极功函数对 MOS 太阳能电池实验 J-VG 特性的影响,目的是研究太阳能电池在能量收集方面的应用。Sentaurus TCAD 仿真和实验 J-VG 特性表明,栅极功函数的增加会导致反向电流密度的增加。TCAD 模拟中使用的 Mg、Al 和未退火 TiN 的功函数分别为 3.7 eV、4.1 eV 和 4.4 eV。据观察,与 Al(~ - 0.42 V)和 Al/MgO/Mg 堆栈(~ - 0.47 V)相比,TiN 在正向偏压区 0.5 mA/cm2 时的起始电压较低(~ - 0.06 V)。另一方面,与 Al/ MgO/Mg 叠层栅极相比,TiN 和 Al 的正向偏压电流密度急剧增加,Al 和 Mg 之间的 MgO 薄层与 Mg/Si-OxNy/Si 结构的势垒方向相反,这意味着 Al/MgO/Mg/SiOxNy/Si 太阳能电池的起始电压降低。对于铝/氧化镁/镁叠层,氧化镁层的势垒效应被拟合为串联重阻 RS = 100 Ω,等效铝/氧化镁/镁功函数为 4.15 eV,考虑到衬底掺杂 NA = 1.2x1016 cm-3 和平行电导 GP = 0。此外,Al/SiOxNy/Si 电池的实验 JxVG 特性是在 Al 功函数为 4.10 eV、串联电阻 RS = 100 Ω、并联电阻 RP = 0.02 Ω(GP = 50 S)和衬底掺杂 NA = 5.5x1015 cm-3 的条件下拟合的。在这种情况下,拟合的高并联电导归因于通过电介质的隧道效应,这可能是由于 SiOxNy 层中去fects 的高浓度造成的。最后,与商用户外太阳能电池相比,MOS 太阳能电池的参数相对较低,但 MOS 电池产生的功率达到了毫瓦级,光能到电能的转换效率(12.7%)高于能量收集太阳能电池的典型值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of the gate work function on the experimental I-V characteristics of MOS solar cells simulated with the Sentaurus TCAD software
In this work, the influence of gate work function on the experimental J-VG characteristics of MOS solar cells was investigated with the aid of the Sentaurus TCAD for 2D numer-ical simulations of TiN/SiOxNy/Si Al/SiOxNy/Si and Al/MgO/Mg/SiOxNy/Si structures aiming at solar cells for en-ergy harvesting applications. The increase of the gate work function led to the increase of the reverse current density as pointed out by the Sentaurus TCAD simulations and by the ex-perimental J-VG characteristics. The work functions of Mg, Al, and un-annealed TiN used in the TCAD simulations were 3.7 eV, 4.1 eV, and 4.4 eV, respectively. It was observed that the onset voltage at 0.5 mA/cm2 in the forward-biasing region was at a lower voltage for TiN (~ - 0.06 V) compared to Al (~ - 0.42 V) and the Al/MgO/Mg stack (~ - 0.47 V). On the other hand, the current density increased steeply in the forward biasing for TiN and Al compared to the Al/ MgO/Mg stack gate and the thin MgO layer between Al and Mg worked as a potential barrier in an opposite direction to the potential barrier of the Mg/Si-OxNy/Si structure, which meant an onset voltage lowering for the Al/MgO/Mg/SiOxNy/Si solar cell. For the Al/MgO/Mg stack, the barrier effect of the MgO layer was fitted as a series re-sistance RS = 100 Ω and an equivalent Al/MgO/Mg work func-tion of 4.15 eV considering a substrate doping NA = 1.2x1016 cm-3 and parallel conductance GP = 0. Also, the experimental JxVG characteristic of the Al/SiOxNy/Si cell was fitted for Al work function of 4.10 eV, a series resistance RS = 100 Ω, a parallel resistance RP = 0.02 Ω (GP = 50 S) and a substrate doping NA = 5.5x1015 cm-3. In this case, the high parallel conductance fitted was attributed to the tunneling through the dielectrics as a pre-dominant effect possibly caused by a high concentration of de-fects in the SiOxNy layer. Finally, the MOS solar cell parameters were relatively lower compared to those of commercial outdoor solar cells, but the power generated by the MOS cells reached the mW range, and the conversion efficiency from light energy into electrical energy was higher (12.7%) than the typical values found for energy-harvesting solar cells.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Journal of Integrated Circuits and Systems
Journal of Integrated Circuits and Systems Engineering-Electrical and Electronic Engineering
CiteScore
0.90
自引率
0.00%
发文量
39
期刊介绍: This journal will present state-of-art papers on Integrated Circuits and Systems. It is an effort of both Brazilian Microelectronics Society - SBMicro and Brazilian Computer Society - SBC to create a new scientific journal covering Process and Materials, Device and Characterization, Design, Test and CAD of Integrated Circuits and Systems. The Journal of Integrated Circuits and Systems is published through Special Issues on subjects to be defined by the Editorial Board. Special issues will publish selected papers from both Brazilian Societies annual conferences, SBCCI - Symposium on Integrated Circuits and Systems and SBMicro - Symposium on Microelectronics Technology and Devices.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信