具有抗耐甲氧西林金黄色葡萄球菌(MRSA)特性的聚二甲基硅氧烷(PDMS)纳米结构薄膜的制作工艺

IF 1 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
N. L. M. Shamsuddin, K. Mohamed
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引用次数: 0

摘要

物理形貌修饰是制造具有抗菌特性的纳米结构表面的一种方法。基于光刻技术的方法是开发所需尺寸和几何形状的有效技术。利用 PMMA 成像层复制成型技术制造了 PDMS 纳米结构,并使用 FESEM 和 AFM 对其进行了表征。结构表面上革兰氏阳性细菌的细胞活力降低了近 80%,细胞一旦附着到结构表面就会变形和破裂。因此,PDMS 结构表面增强了薄膜的杀菌性能,有效抑制了细菌的附着。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The fabrication process of polydimethylsiloxane (PDMS) nanostructured films with antimicrobial properties against methicillin-resistant staphylococcus aureus (MRSA)
Physical topography modification is an approach to fabricate nanostructures surfaces with antimicrobial properties. Lithography-based technologies offer an effective technique to develop the desired sizes and geometry. The replica molding technique was employed to fabricate the PDMS nanostructures using the PMMA imaging layer and characterized using a FESEM and AFM. The cell viability of gram-positive bacteria on structural diminished by almost 80% and the cells were deformed and ruptured once attached to the structured surface. Thus, the PDMS structured surface enhanced the bactericidal properties of the film, which effectively inhibit bacterial attachment.
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来源期刊
Digest Journal of Nanomaterials and Biostructures
Digest Journal of Nanomaterials and Biostructures 工程技术-材料科学:综合
CiteScore
1.50
自引率
22.20%
发文量
116
审稿时长
4.3 months
期刊介绍: Under the aegis of the Academy of Romanian Scientists Edited by: -Virtual Institute of Physics operated by Virtual Company of Physics.
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