从霍普夫不变式的几何视角构建霍普夫绝缘体

IF 3.5 2区 物理与天体物理 Q1 PHYSICS, MULTIDISCIPLINARY
Zhi-Wen Chang, Wei-Chang Hao, Miguel Bustamante, Xin Liu
{"title":"从霍普夫不变式的几何视角构建霍普夫绝缘体","authors":"Zhi-Wen Chang, Wei-Chang Hao, Miguel Bustamante, Xin Liu","doi":"10.1088/0256-307x/41/3/037302","DOIUrl":null,"url":null,"abstract":"We propose a method to construct Hopf insulators based on the study of topological defects from the geometric perspective of Hopf invariant <italic toggle=\"yes\">I</italic>. Firstly, we prove two types of topological defects naturally inhering in the inner differential structure of the Hopf mapping. One type is the four-dimensional point defects, which lead to a topological phase transition occurring at the Dirac points. The other type is the three-dimensional merons, whose topological charges give the evaluations of <italic toggle=\"yes\">I</italic>. Then, we show two ways to establish the Hopf insulator models. One approach is to modify the locations of merons, thereby the contributions of charges to <italic toggle=\"yes\">I</italic> will change. The other is related to the number of defects. It is found that <italic toggle=\"yes\">I</italic> will decrease if the number reduces, while increase if additional defects are added. The method developed in this study is expected to provide a new perspective for understanding the topological invariants, which opens a new door in exploring and designing novel topological materials in three dimensions.","PeriodicalId":10344,"journal":{"name":"Chinese Physics Letters","volume":"128 1","pages":""},"PeriodicalIF":3.5000,"publicationDate":"2024-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Constructing Hopf Insulator from Geometric Perspective of Hopf Invariant\",\"authors\":\"Zhi-Wen Chang, Wei-Chang Hao, Miguel Bustamante, Xin Liu\",\"doi\":\"10.1088/0256-307x/41/3/037302\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We propose a method to construct Hopf insulators based on the study of topological defects from the geometric perspective of Hopf invariant <italic toggle=\\\"yes\\\">I</italic>. Firstly, we prove two types of topological defects naturally inhering in the inner differential structure of the Hopf mapping. One type is the four-dimensional point defects, which lead to a topological phase transition occurring at the Dirac points. The other type is the three-dimensional merons, whose topological charges give the evaluations of <italic toggle=\\\"yes\\\">I</italic>. Then, we show two ways to establish the Hopf insulator models. One approach is to modify the locations of merons, thereby the contributions of charges to <italic toggle=\\\"yes\\\">I</italic> will change. The other is related to the number of defects. It is found that <italic toggle=\\\"yes\\\">I</italic> will decrease if the number reduces, while increase if additional defects are added. The method developed in this study is expected to provide a new perspective for understanding the topological invariants, which opens a new door in exploring and designing novel topological materials in three dimensions.\",\"PeriodicalId\":10344,\"journal\":{\"name\":\"Chinese Physics Letters\",\"volume\":\"128 1\",\"pages\":\"\"},\"PeriodicalIF\":3.5000,\"publicationDate\":\"2024-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chinese Physics Letters\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1088/0256-307x/41/3/037302\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"PHYSICS, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chinese Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1088/0256-307x/41/3/037302","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"PHYSICS, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

我们从霍普夫不变量 I 的几何视角出发,提出了一种基于拓扑缺陷研究的霍普夫绝缘体构造方法。首先,我们证明了霍普夫映射的内微分结构中自然继承的两类拓扑缺陷。一种是四维点缺陷,它导致在狄拉克点发生拓扑相变。另一类是三维梅龙子,其拓扑电荷给出了 I 的估值。一种方法是改变梅龙子的位置,从而改变电荷对 I 的贡献。另一种方法与缺陷数量有关。研究发现,如果缺陷数量减少,I 会减小,而如果缺陷数量增加,I 会增大。本研究开发的方法有望为理解拓扑不变量提供一个新的视角,为探索和设计新型三维拓扑材料打开一扇新的大门。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Constructing Hopf Insulator from Geometric Perspective of Hopf Invariant
We propose a method to construct Hopf insulators based on the study of topological defects from the geometric perspective of Hopf invariant I. Firstly, we prove two types of topological defects naturally inhering in the inner differential structure of the Hopf mapping. One type is the four-dimensional point defects, which lead to a topological phase transition occurring at the Dirac points. The other type is the three-dimensional merons, whose topological charges give the evaluations of I. Then, we show two ways to establish the Hopf insulator models. One approach is to modify the locations of merons, thereby the contributions of charges to I will change. The other is related to the number of defects. It is found that I will decrease if the number reduces, while increase if additional defects are added. The method developed in this study is expected to provide a new perspective for understanding the topological invariants, which opens a new door in exploring and designing novel topological materials in three dimensions.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Chinese Physics Letters
Chinese Physics Letters 物理-物理:综合
CiteScore
5.90
自引率
8.60%
发文量
13238
审稿时长
4 months
期刊介绍: Chinese Physics Letters provides rapid publication of short reports and important research in all fields of physics and is published by the Chinese Physical Society and hosted online by IOP Publishing.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信