Mokhov Evgeniy N, Baranov Pavel G, Kazarova Olga P
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引用次数: 0
摘要
我们对升华生长的碳化硅晶体中的固有缺陷进行了全面研究,这些缺陷取决于生长条件和热退火。在 2200 °C 以下的低温条件下通过物理气相传输生长的富硅碳化硅晶体中发现了包括碳空位(VC)和杂质原子在内的本征缺陷复合物。在用高能粒子辐照的碳化硅晶体中也观察到了类似的缺陷。生长的碳化硅晶体中的固有缺陷具有高热稳定性的特点,这与活性逸散簇的存在有关。实验证明,活性簇存在于较宽的温度范围内(高达 2600 ℃)。实验表明,本征缺陷也可以通过从 p 型外延层的高温扩散引入碳化硅晶体。碳化硅中的顺磁缺陷被认为是环境条件下传感、量子光子学和信息处理的材料平台。
Intrinsic defects in non-irradiated silicon carbide crystals
A comprehensive study of the intrinsic defects in sublimation-grown SiC crystals, depending on the growth conditions and thermal annealing is carried out. Complexes of the intrinsic defects including carbon vacancy (VC) and impurities atoms are found in the Si-rich SiC crystals grown by physical vapor transport at low temperatures below 2200 °C. Similar defects are also observed in the SiC crystals irradiated with high-energy particles. Intrinsic defects in grown SiC crystals are characterized by high thermal stability, which is associated with the presence of active metastable clusters. Experimental evidence for the presence of the active clusters in the wide temperature range (up to 2600 °C) is presented. It is shown that intrinsic defects can be also introduced in the SiC crystal by high-temperature diffusion from the p-type epitaxial layer. Paramagnetic defects in SiC are considered a material platform for sensing, quantum photonics, and information processing at ambient conditions.