测量薄膜的折射率和厚度:光学偏振实验

Xiaoqi Zeng, Ji Chen, Xiaofeng Wang, Mingzhen Shao
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引用次数: 0

摘要

我们提出了一种同时测量薄膜折射率和厚度的教学仪器。该仪器包括:二极管激光器、偏振器、光谱仪、光电二极管和便携式数字万用表。利用该仪器,我们测量了两层薄膜(硅上的二氧化硅薄膜和硅上的氮化硅薄膜)的折射率和厚度。我们的仪器与椭偏仪之间的最大误差为 1.4%。我们还通过数值模拟分析了仪器的误差。使用本实验所描述的仪器进行实验有几个有价值的教学成果:1) 了解薄膜中的多光束干涉;2) 应用秩方最小化;3) 进行多参数非线性曲线拟合。该实验室可用于本科二年级学生的光学偏振教学。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Measuring the Refractive Index and Thickness of a Thin Film: an Optical Polarization Experiment
We propose a teaching apparatus to simultaneously measure the refractive index and thickness of a thin film. The apparatus includes: a diode laser, a polarizer, a spectrometer, a photodiode and a portable digital multimeter. With the apparatus, we measure the refractive index and thickness of two thin films (a silicon dioxide film on silicon, a silicon nitride film on silicon). The maximum discrepancy between our apparatus and an ellipsometer is 1.4%. We also analyze the errors of our apparatus by numerical simulations. The lab with the apparatus described here has several valuable pedagogical outcomes: 1) understanding the multi-beam interference in a film; 2) applying chi-square minimization; 3) carrying out the nonlinear curve fitting with multiple parameters. The lab can be used in an optical polarization teaching for undergraduate sophomores.
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