{"title":"等离子体条件变化下氩介质势垒放电反应器优化功率沉积的比较研究","authors":"E. Poorreza, R. Hadjiaghaie Vafaie","doi":"10.1134/S0040579523330059","DOIUrl":null,"url":null,"abstract":"<p>Gas discharges in the plasma atmosphere are known to consist of a collection of different particles, mainly electrons, ions, neutral atoms, and molecules. The present need is to characterize the plasmas and optimization of the designed plasma system under variable conditions. In this work, a time-dependent, one-dimensional simulation of an optimized DBD device, driven by a sinusoidal alternating high voltage, in argon gas is demonstrated. First of all, a DBD device with two electrodes, covered by the dielectric and with the variable discharge gap was assumed, and the discharge parameters were simulated versus time across the plasma gap. A comparison between the results is carried out. In the second part, with a fixed gap that was obtained from previous section, when the dielectric thickness changed, the plasma parameters were simulated. In the third case, with a fixed discharge gap and dielectric thickness, the plate diameters were varied and the best diameter was selected to deliver the best power deposition. Finally, the operating frequency and voltage were varied and the optimized values were obtained. Time-dependent and 1D profiles of the electric field, electron density, electron temperature, ion current density, electron current density, plasma, total current, and power deposition are demonstrated.</p>","PeriodicalId":798,"journal":{"name":"Theoretical Foundations of Chemical Engineering","volume":null,"pages":null},"PeriodicalIF":0.7000,"publicationDate":"2024-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A Comparative Investigation of an Argon Dielectric Barrier Discharge Reactor under the Variation of Plasma Conditions for Optimization of Power Deposition\",\"authors\":\"E. Poorreza, R. Hadjiaghaie Vafaie\",\"doi\":\"10.1134/S0040579523330059\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Gas discharges in the plasma atmosphere are known to consist of a collection of different particles, mainly electrons, ions, neutral atoms, and molecules. The present need is to characterize the plasmas and optimization of the designed plasma system under variable conditions. In this work, a time-dependent, one-dimensional simulation of an optimized DBD device, driven by a sinusoidal alternating high voltage, in argon gas is demonstrated. First of all, a DBD device with two electrodes, covered by the dielectric and with the variable discharge gap was assumed, and the discharge parameters were simulated versus time across the plasma gap. A comparison between the results is carried out. In the second part, with a fixed gap that was obtained from previous section, when the dielectric thickness changed, the plasma parameters were simulated. In the third case, with a fixed discharge gap and dielectric thickness, the plate diameters were varied and the best diameter was selected to deliver the best power deposition. Finally, the operating frequency and voltage were varied and the optimized values were obtained. Time-dependent and 1D profiles of the electric field, electron density, electron temperature, ion current density, electron current density, plasma, total current, and power deposition are demonstrated.</p>\",\"PeriodicalId\":798,\"journal\":{\"name\":\"Theoretical Foundations of Chemical Engineering\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.7000,\"publicationDate\":\"2024-03-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Theoretical Foundations of Chemical Engineering\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1134/S0040579523330059\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"ENGINEERING, CHEMICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Theoretical Foundations of Chemical Engineering","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1134/S0040579523330059","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, CHEMICAL","Score":null,"Total":0}
A Comparative Investigation of an Argon Dielectric Barrier Discharge Reactor under the Variation of Plasma Conditions for Optimization of Power Deposition
Gas discharges in the plasma atmosphere are known to consist of a collection of different particles, mainly electrons, ions, neutral atoms, and molecules. The present need is to characterize the plasmas and optimization of the designed plasma system under variable conditions. In this work, a time-dependent, one-dimensional simulation of an optimized DBD device, driven by a sinusoidal alternating high voltage, in argon gas is demonstrated. First of all, a DBD device with two electrodes, covered by the dielectric and with the variable discharge gap was assumed, and the discharge parameters were simulated versus time across the plasma gap. A comparison between the results is carried out. In the second part, with a fixed gap that was obtained from previous section, when the dielectric thickness changed, the plasma parameters were simulated. In the third case, with a fixed discharge gap and dielectric thickness, the plate diameters were varied and the best diameter was selected to deliver the best power deposition. Finally, the operating frequency and voltage were varied and the optimized values were obtained. Time-dependent and 1D profiles of the electric field, electron density, electron temperature, ion current density, electron current density, plasma, total current, and power deposition are demonstrated.
期刊介绍:
Theoretical Foundations of Chemical Engineering is a comprehensive journal covering all aspects of theoretical and applied research in chemical engineering, including transport phenomena; surface phenomena; processes of mixture separation; theory and methods of chemical reactor design; combined processes and multifunctional reactors; hydromechanic, thermal, diffusion, and chemical processes and apparatus, membrane processes and reactors; biotechnology; dispersed systems; nanotechnologies; process intensification; information modeling and analysis; energy- and resource-saving processes; environmentally clean processes and technologies.