在扫描氦显微镜中测量散射分布

IF 2.1 3区工程技术 Q2 MICROSCOPY

Ultramicroscopy Pub Date : 2024-03-07 DOI:10.1016/j.ultramic.2024.113951

C.J. Hatchwell , M. Bergin , B. Carr , M.G. Barr , A. Fahy , P.C. Dastoor

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引用次数: 0

摘要

扫描氦显微镜通常使用热能氦原子束，其能量和波长（¡100 meV，∼0.05 nm）对表面结构特别敏感。本文介绍了一种用于扫描氦显微镜的角度探测器平台，可方便地对样品的散射分布进行现场测量。我们首先展示了有序表面的典型弹性和非弹性散射。接着，我们展示了形貌在无序表面漫散射中的作用，观察到与简单余弦散射的偏差。总之，这些研究展示了利用该技术获得的散射分布所包含的丰富信息。

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Measuring scattering distributions in scanning helium microscopy

A scanning helium microscope typically utilises a thermal energy helium atom beam, with an energy and wavelength (¡100 meV, $\sim$ 0.05 nm) particularly sensitive to surface structure. An angular detector stage for a scanning helium microscope is presented that facilitates the in-situ measurement of scattering distributions from a sample. We begin by demonstrating typical elastic and inelastic scattering from ordered surfaces. We then go on to show the role of topography in diffuse scattering from disordered surfaces, observing deviations from simple cosine scattering. In total, these studies demonstrate the wealth of information that is encoded into the scattering distributions obtained with the technique.

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来源期刊

Ultramicroscopy 工程技术-显微镜技术

CiteScore

4.60

自引率

13.60%

发文量

117

审稿时长

5.3 months

期刊介绍： Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.